Nanoscale apertures having islands of functionality
First Claim
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1. An array of nanoscale apertures comprising:
- a transparent substrate having a cladding layer disposed on its surface, the cladding layer having a plurality of nanoscale apertures extending therethrough;
each nanoscale aperture having walls and a base, wherein an isolation layer is on the walls and on a portion of the base of the nanoscale aperture;
wherein a portion of the base of the nanoscale aperture comprises an island of substrate surrounded by isolation layer;
wherein the size of the opening of each nanoscale aperture, including the isolation layer, is larger than the width of the island of substrate.
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Abstract
Methods, compositions and arrays for non-random loading of single analyte molecules into array structures are provided. Arrays of confined regions are produced wherein each confined region comprises a single island within the confined region. The island can be selectively functionalized with a coupling agent to couple a single molecule of interest within the confined region.
21 Citations
20 Claims
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1. An array of nanoscale apertures comprising:
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a transparent substrate having a cladding layer disposed on its surface, the cladding layer having a plurality of nanoscale apertures extending therethrough; each nanoscale aperture having walls and a base, wherein an isolation layer is on the walls and on a portion of the base of the nanoscale aperture;
wherein a portion of the base of the nanoscale aperture comprises an island of substrate surrounded by isolation layer;
wherein the size of the opening of each nanoscale aperture, including the isolation layer, is larger than the width of the island of substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for forming an island of substrate surface within a nanoscale aperture comprising:
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providing a substrate having a cladding layer on top, the cladding layer having a plurality of nanoscale apertures extending therethrough; conformally depositing an isolation layer on the cladding layer and exposed portions of the substrate; conformally depositing a sacrificial layer onto the top of the isolation layer; directionally etching the sacrificial layer such that the sacrificial layer remains on the walls of the nanoscale apertures, and the sacrificial layer is removed from the region of the nanoscale aperture between the sacrificial layer on the walls, exposing a portion of the isolation layer within the nanoscale aperture; etching the portion of the isolation layer within the nanoscale aperture to expose a portion of the substrate; and removing the sacrificial layer to produce a structure having an island of exposed substrate surface surrounded by isolation layer within each nanoscale aperture. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A method for forming an island of substrate surface within a nanoscale aperture comprising:
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depositing an isolation layer onto a transparent substrate; forming nanopits in the isolation layer that extend to the substrate surface; depositing, exposing, and developing a resist to form a pillar of resist on top of and extending over each nanopit; depositing a cladding layer such that the cladding layer covers the pillars of resist and the exposed regions of isolation layer; and removing the resist resulting in lift-off of the portion of the cladding layer covering the pillars of resist, thereby forming a nanoscale apertures in the cladding layer, each having a nanopit at its base surrounded by isolation layer.
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Specification