Metal oxy-flouride films based on oxidation of metal flourides

• US 10,563,303 B2
• Filed: 04/27/2018
• Issued: 02/18/2020
• Est. Priority Date: 05/10/2017
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Wu, Xiaowei, Fenwick, David, Zhan, Guodong, Sun, Jennifer Y., Rice, Michael R.
• Primary Examiner(s): Chen, Bret P
• Application Number:
  US15/965,813
• Publication Number:
  US 20180327899A1
• Time in Patent Office: 662 Days
• CPC Class Codes: B32B 15/00 Layered products comprising a layer of metal
• CPC Class Codes: B32B 15/04 comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material next to a bituminous or tarry layer B32B11/08; next to a water-setting substance layer B32B13/06; next to a glass layer B32B17/061; next to a cellulosic plastic layer B32B23/042
• CPC Class Codes: B32B 2250/02 2 layers
• CPC Class Codes: B32B 2250/03 3 layers
• CPC Class Codes: B32B 2255/06 on metal layer
• CPC Class Codes: B32B 2255/20 Inorganic coating
• CPC Class Codes: B32B 2311/00 Metals, their alloys or their compounds
• CPC Class Codes: B32B 2315/02 Ceramics
• CPC Class Codes: B32B 9/005 comprising one layer of ceramic material, e.g. porcelain, ceramic tile layered products with at least two ceramic layers composed mainly of ceramic B32B18/00
• CPC Class Codes: B32B 9/04 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material next to a glass layer B32B17/06; layered products with at least two ceramic layers composed mainly of ceramic B32B18/00
• CPC Class Codes: C23C 14/081 of aluminium, magnesium or beryllium
• CPC Class Codes: C23C 14/221 Ion beam deposition C23C14/46, C23C14/48 take precedence
• CPC Class Codes: C23C 14/5826 Treatment with charged particles C23C14/582 takes precedence
• CPC Class Codes: C23C 14/5846 Reactive treatment
• CPC Class Codes: C23C 16/28 Deposition of only one other non-metal element
• CPC Class Codes: C23C 16/30 Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
• CPC Class Codes: C23C 16/403 of aluminium, magnesium or beryllium
• CPC Class Codes: C23C 16/405 of refractory metals or yttrium
• CPC Class Codes: C23C 16/4404 Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
• CPC Class Codes: C23C 16/452 by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
• CPC Class Codes: C23C 16/45525 : Atomic layer deposition [ALD]
• CPC Class Codes: C23C 16/45536 : Use of plasma, radiation or electromagnetic fields
• CPC Class Codes: C23C 16/45555 : applied in non-semiconductor technology
• CPC Class Codes: C23C 16/56 : After-treatment
• CPC Class Codes: C23C 28/04 : only coatings of inorganic non-metallic material
• CPC Class Codes: C23C 28/042 : including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
• CPC Class Codes: C23C 28/42 : characterized by the composition of the alternating layers
• CPC Class Codes: C23C 4/11 : Oxides
• CPC Class Codes: C23C 4/134 : Plasma spraying
• CPC Class Codes: C23C 4/18 : After-treatment
• CPC Class Codes: H01J 2237/332 : Coating
• CPC Class Codes: H01J 2237/334 : Etching
• CPC Class Codes: H01J 37/32357 : Generation remote from the workpiece, e.g. down-stream
• CPC Class Codes: H01J 37/32908 : Utilities
• CPC Class Codes: H01J 37/32963 : End-point detection
• CPC Class Codes: Y10T 428/12028 : Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
• CPC Class Codes: Y10T 428/12049 : Nonmetal component
• CPC Class Codes: Y10T 428/12667 : Oxide of transition metal or Al
• CPC Class Codes: Y10T 428/31504 : Composite [nonstructural laminate]
• CPC Class Codes: Y10T 428/31678 : Of metal

Abstract

An article comprises a body having a coating. The coating comprises a Y-O-F coating or other yttrium-based oxy-fluoride coating generated either by performing a fluorination process on a yttrium-based oxide coating or an oxidation process on a yttrium-based fluorine coating.

Claims

1. A method comprising:

performing atomic layer deposition (ALD), chemical vapor deposition (CVD) or electron beam ion assisted deposition (EB-IAD) to deposit a yttrium-based fluoride coating having a thickness of about 10 nm to about 10 microns onto a surface of a chamber component for a processing chamber;

heating the chamber component to an elevated temperature of about 150-1500°

C.;

exposing the chamber component to an oxygen source comprising an oxygen-based plasma or radicals at the elevated temperature for a duration of about 0.1-72 hours; and

converting the yttrium-based fluoride coating into a yttrium-based oxy-fluoride coating.

2. The method of claim 1, wherein depositing the yttrium-based fluoride coating comprises one of:

performing ALD to deposit the yttrium-based fluoride coating, the yttrium-based fluoride coating having a thickness of about 10 nm to about 10 μ

m;

performing EB-IAD or to deposit the yttrium-based fluoride coating, the yttrium-based fluoride coating having a thickness of about 1-10 μ

m;

or

performing CVD or to deposit the yttrium-based fluoride coating, the yttrium-based fluoride coating having a thickness of about 100 nm-10 μ

m.

3. The method of claim 1, wherein the chamber component comprises metal and the elevated temperature is about 150-650°

C.

4. The method of claim 1, wherein exposing the chamber component to the oxygen source comprises performing at least one of flowing an O₂ plasma or flowing O₂ radicals.

5. The method of claim 1, wherein:

the chamber component comprises a material having a first coefficient of thermal expansion (CTE) that is lower than a second CTE of the yttrium-based fluoride coating;

the depositing of the yttrium-based fluoride coating is performed at a deposition temperature of about 200-300°

C., wherein the yttrium-based fluoride coating has an internal tensile stress at temperatures below the deposition temperature and an internal compressive stress at temperatures above the deposition temperature; and

converting the yttrium-based fluoride coating into the yttrium-based oxy-fluoride coating causes a volume contraction and introduces a) reduced internal tensile stress at the temperatures below the deposition temperature that is lower than the internal tensile stress of the yttrium-based fluoride coating at the temperatures below the deposition temperature and b) increased internal compressive stress at the temperatures above the deposition temperature that is higher than the internal compressive stress of the yttrium-based fluoride coating at the temperatures above the deposition temperature.

6. The method of claim 1, wherein the yttrium-based fluoride coating is YF₃ and the yttrium-based oxy-fluoride coating is Y-O-F.

7. The method of claim 1, wherein the yttrium-based fluoride coating is a YF₃-ZrF₄ solid solution and the yttrium-based oxy-fluoride coating is Y-Zr-O-F.

8. The method of claim 1, wherein the yttrium-based fluoride coating comprises an alternating stack of YF₃ layers having a first thickness and AlF₃ layers having a second thickness that is approximately 1/10 to ⅕

of the first thickness, and wherein the yttrium-based oxyfluoride layer comprises an alternating stack of Y-O-F layers approximately having the first thickness and Al-O-F layers approximately having the second thickness.

9. The method of claim 1, wherein the yttrium-based oxy-fluoride coating comprises a composite ceramic comprising a first phase of Y-Al-O-F and a second phase of Y-Zr-O-F.