Model-based scanner tuning systems and methods
First Claim
Patent Images
1. A method comprising:
- obtaining a set of tunable parameters of a lithographic apparatus model that characterizes imaging performance of a lithographic apparatus;
simulating, by a hardware computer system, a wafer contour based on a design layout and a simulated lithographic process using an initial set of values of the set of tunable parameters;
comparing the simulated wafer contour with a reference wafer contour to generate a differential metric; and
adjusting one or more values of the set of tunable parameters until the differential metric has a desired value such that imaging performance of the lithographic apparatus is within a tolerance to imaging performance of a reference lithographic apparatus, the one or more values of the set of tunable parameters configured to guide setting or change of a physical configuration of a physical lithographic apparatus for optical imaging onto a physical substrate.
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Abstract
Systems and methods for tuning photolithographic processes are described. A model of a target scanner is maintained defining sensitivity of the target scanner with reference to a set of tunable parameters. A differential model represents deviations of the target scanner from the reference. The target scanner may be tuned based on the settings of the reference scanner and the differential model. Performance of a family of related scanners may be characterized relative to the performance of a reference scanner. Differential models may include information such as parametric offsets and other differences that may be used to simulate the difference in imaging behavior.
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Citations
20 Claims
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1. A method comprising:
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obtaining a set of tunable parameters of a lithographic apparatus model that characterizes imaging performance of a lithographic apparatus; simulating, by a hardware computer system, a wafer contour based on a design layout and a simulated lithographic process using an initial set of values of the set of tunable parameters; comparing the simulated wafer contour with a reference wafer contour to generate a differential metric; and adjusting one or more values of the set of tunable parameters until the differential metric has a desired value such that imaging performance of the lithographic apparatus is within a tolerance to imaging performance of a reference lithographic apparatus, the one or more values of the set of tunable parameters configured to guide setting or change of a physical configuration of a physical lithographic apparatus for optical imaging onto a physical substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A computer program product comprising a non-transitory computer readable medium having instructions thereon configured to cause a computer to at least:
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obtain a set of tunable parameters of a lithographic apparatus model that characterizes imaging performance of a lithographic apparatus; simulate a wafer contour based on a design layout and a simulated lithographic process using an initial set of values of the set of tunable parameters; compare the simulated wafer contour with a reference wafer contour to generate a differential metric; and adjust one or more values of the set of tunable parameters until the differential metric has a desired value such that imaging performance of the lithographic apparatus is within a tolerance to imaging performance of a reference lithographic apparatus, the one or more values of the set of tunable parameters configured to guide setting or change of a physical configuration of a physical lithographic apparatus for optical imaging onto a physical substrate. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification