High refractive index waveguides and method of fabrication

• US 10,585,243 B2
• Filed: 12/02/2016
• Issued: 03/10/2020
• Est. Priority Date: 12/02/2015
• Status: Active Grant

• Current Assignee: Trustees Of The University Of Pennsylvania (University of Pennsylvania)
• Original Assignee: Trustees Of The University Of Pennsylvania (University of Pennsylvania)
• Inventors: Bassett, Lee, Grote, Richard
• Primary Examiner(s): Rojas, Omar R
• Application Number:
  US15/777,975
• Publication Number:
  US 20180348431A1
• Time in Patent Office: 1,194 Days
• CPC Class Codes: G02B 2006/12035 Materials
• CPC Class Codes: G02B 2006/12038 Glass (SiO2 based materials)
• CPC Class Codes: G02B 2006/12088 Monomode
• CPC Class Codes: G02B 2006/12097 Ridge, rib or the like
• CPC Class Codes: G02B 2006/12173 Masking
• CPC Class Codes: G02B 6/12004 Combinations of two or more optical elements
• CPC Class Codes: G02B 6/1223 high refractive index type, i.e. high-contrast waveguides
• CPC Class Codes: G02B 6/132 by deposition of thin films
• CPC Class Codes: G02B 6/136 by etching

Abstract

Optical component and methods for forming optical components are described. The optical component includes a substrate having a base and a fin extending from the base, a buffer layer formed on the substrate leaving a portion of the fin exposed, and a confinement layer deposited over the buffer layer and the fin. The refractive index of the substrate is greater than the refractive index of the confinement layer, and the refractive index of the confinement layer is greater than the refractive index of the buffer layer.

Claims

1. A method for fabricating an optical component, comprising:

forming, on a substrate having a base and a fin extending from the base, a buffer layer leaving a portion of the fin exposed and having sides and a top, each of which extends above the buffer layer, the substrate having a first refractive index and the buffer material having a second refractive index; and

depositing a confinement layer over the buffer layer and directly on the sides and the top of the portion of the fin that extends above the buffer layer to form an optical waveguide, the confinement layer having a third refractive index;

wherein the first refractive index is greater than the third refractive index, and the third refractive index is greater than the second refractive index.

2. The method of claim 1, wherein;

the substrate is diamond, silicon or silicon carbide, the buffer layer is silicon dioxide, and the confinement layer is silicon nitride.

3. The method of claim 1, further comprising:

fabricating electronic circuitry and photonic integrated circuit devices on the substrate and connecting the electronic circuitry via the optical waveguide.

4. An optical component, comprising:

a substrate having a base and a fin extending from the base, the substrate having a first refractive index;

a buffer layer formed on the substrate leaving a portion of the fin exposed and having sides and a top, each of which extends above the buffer layer, the buffer layer having a second refractive index; and

a confinement layer deposited over the buffer layer and directly on the sides and the top of the portion of the fin that extends above the buffer layer, the confinement layer having a third refractive index;

wherein the first refractive index is greater than the third refractive index, and the third refractive index is greater than the second refractive index.

5. The optical component of claim 4, wherein;

the substrate is diamond, silicon or silicon carbide, the buffer layer is silicon dioxide, and the confinement layer is silicon nitride.

6. The optical component of claim 4, further comprising:

electronic circuitry and photonic integrated circuit devices fabricated on the substrate and connected via the optical waveguide.