Semiconductor process modeling to enable skip via in place and route flow
First Claim
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1. A method for incorporating skip vias in a place and route flow of an integrated circuit design, the method comprising:
- employing a place and route tool to add the skip vias, each skip via extending through a metallization layer to electrically connect a metal layer above the metallization layer to a metal layer below the metallization layer;
automatically adding the skip vias during the place and route flow; and
when a violation of a design rule is detected due to the addition of one or more of the skip vias, substituting skip vias that violate the design rule with a standard via in a newly generated physical layout.
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Abstract
A method is presented for incorporating skip vias in a place and route flow of an integrated circuit design. The method includes employing a place and route tool to add the skip vias, each skip via extending through a metallization layer to electrically connect a metal layer above the metallization layer to a metal layer below the metallization layer and, when a violation of a design rule is detected due to the addition of one or more of the skip vias, substituting skip vias that violate the design rule with a standard via.
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5 Claims
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1. A method for incorporating skip vias in a place and route flow of an integrated circuit design, the method comprising:
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employing a place and route tool to add the skip vias, each skip via extending through a metallization layer to electrically connect a metal layer above the metallization layer to a metal layer below the metallization layer;
automatically adding the skip vias during the place and route flow; andwhen a violation of a design rule is detected due to the addition of one or more of the skip vias, substituting skip vias that violate the design rule with a standard via in a newly generated physical layout. - View Dependent Claims (2, 3, 4, 5)
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Specification