Chemical treatment, deposition and/or infiltration apparatus and method for using the same
First Claim
1. A chemical deposition, treatment and/or infiltration apparatus for providing a chemical reaction on or in a surface of a substrate, wherein the apparatus comprises:
- a top reaction chamber part and a bottom reaction chamber part forming together a closed reaction chamber;
an actuator coupled to at least one of the top reaction chamber part and the bottom reaction chamber part and configured to move the at least one of the top reaction chamber part and the bottom reaction chamber part with respect to the other in a first direction from an open position to a closed position to form the closed reaction chamber;
at least two top substrate holders coupled to the top reaction chamber part at two positions substantially opposite from each other with respect to a center of the substrate, wherein the at least two top substrate holders are configured to support the substrate at least when the reaction chamber is in the open position; and
a bottom substrate holder coupled to the bottom reaction chamber part configured to support the substrate in response to the top reaction chamber part being coupled to the bottom reaction chamber part in the closed position forming the closed reaction chamber,wherein the closed reaction chamber is configured to enclose the substrate, and wherein the substrate is supported by at least the bottom substrate holder in the closed reaction chamber.
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Abstract
The disclosure relates to a chemical deposition, treatment and/or infiltration apparatus for providing a chemical reaction on and/or in a surface of a substrate. The apparatus may have a top and a bottom reaction chamber part forming together a closable reaction chamber and an actuator constructed and arranged for moving the top and bottom reaction chamber parts with respect to each other from a closed position to an open position so as to allow access to an interior of the reaction chamber. A top substrate holder is connected to the top reaction chamber part to hold a substrate at least when the reaction chamber is in the open position and a bottom substrate holder is connected to the bottom reaction chamber part to hold the substrate when the reaction chamber is in the closed position.
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Citations
21 Claims
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1. A chemical deposition, treatment and/or infiltration apparatus for providing a chemical reaction on or in a surface of a substrate, wherein the apparatus comprises:
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a top reaction chamber part and a bottom reaction chamber part forming together a closed reaction chamber; an actuator coupled to at least one of the top reaction chamber part and the bottom reaction chamber part and configured to move the at least one of the top reaction chamber part and the bottom reaction chamber part with respect to the other in a first direction from an open position to a closed position to form the closed reaction chamber; at least two top substrate holders coupled to the top reaction chamber part at two positions substantially opposite from each other with respect to a center of the substrate, wherein the at least two top substrate holders are configured to support the substrate at least when the reaction chamber is in the open position; and a bottom substrate holder coupled to the bottom reaction chamber part configured to support the substrate in response to the top reaction chamber part being coupled to the bottom reaction chamber part in the closed position forming the closed reaction chamber, wherein the closed reaction chamber is configured to enclose the substrate, and wherein the substrate is supported by at least the bottom substrate holder in the closed reaction chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A chemical deposition, treatment and/or infiltration apparatus for providing a chemical reaction on or in a surface of a substrate, wherein the apparatus comprises:
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a top reaction chamber part and a bottom reaction chamber part forming together a closed reaction chamber; an actuator coupled to at least one of the top reaction chamber part and the bottom reaction chamber part and configured to move the at least one of the top reaction chamber part and the bottom reaction chamber part with respect to the other in a first direction from an open position to a closed position to form the closed reaction chamber; a top substrate holder coupled to the top reaction chamber part configured to support the substrate at least when the reaction chamber is in the open position, wherein the top substrate holder comprises a U-shape as viewed in the first direction; and a bottom substrate holder coupled to the bottom reaction chamber part configured to support the substrate in response to the top reaction chamber part being coupled to the bottom reaction chamber part in the closed position forming the closed reaction chamber, wherein the closed reaction chamber is configured to enclose the substrate, and wherein the substrate is supported by at least the bottom substrate holder in the closed reaction chamber.
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20. A chemical deposition, treatment and/or infiltration apparatus for providing a chemical reaction on or in a surface of a substrate, wherein the apparatus comprises:
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a top reaction chamber part and a bottom reaction chamber part forming together a closed reaction chamber; an actuator coupled to at least one of the top reaction chamber part and the bottom reaction chamber part and configured to move the at least one of the top reaction chamber part and the bottom reaction chamber part with respect to the other in a first direction from an open position to a closed position to form the closed reaction chamber; a top substrate holder coupled to the top reaction chamber part configured to support the substrate at least when the reaction chamber is in the open position, wherein the top substrate holder comprises an L-shape as viewed in a second direction perpendicular to the first direction; a bottom substrate holder coupled to the bottom reaction chamber part configured to support the substrate in response to the top reaction chamber part being coupled to the bottom reaction chamber part in the closed position forming the closed reaction chamber, wherein the closed reaction chamber is configured to enclose the substrate, and wherein the substrate is supported by at least the bottom substrate holder in the closed reaction chamber; and a substrate handler configured for moving the substrate in the second direction.
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21. A chemical deposition, treatment and/or infiltration apparatus for providing a chemical reaction on or in a surface of a substrate, wherein the apparatus comprises:
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a top reaction chamber part and a bottom reaction chamber part forming together a closed reaction chamber; an actuator coupled to at least one of the top reaction chamber part and the bottom reaction chamber part and configured to move the at least one of the top reaction chamber part and the bottom reaction chamber part with respect to the other in a first direction from an open position to a closed position to form the closed reaction chamber; a top substrate holder coupled to the top reaction chamber part configured to support the substrate at least when the reaction chamber is in the open position, wherein the top substrate holder comprises an upside-down T-shape as viewed in a direction perpendicular to the first direction and a second direction substantially perpendicular to the first direction; and a bottom substrate holder coupled to the bottom reaction chamber part configured to support the substrate in response to the top reaction chamber part being coupled to the bottom reaction chamber part in the closed position forming the closed reaction chamber, wherein the closed reaction chamber is configured to enclose the substrate, and wherein the substrate is supported by at least the bottom substrate holder in the closed reaction chamber.
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Specification