Fast freeform source and mask co-optimization method
First Claim
1. A method for optimizing a lithographic process having an illumination and a patterning device pattern, the method comprising:
- obtaining respective initial descriptions of an illumination and a patterning device pattern for a lithographic process, wherein the patterning device pattern is to be imaged onto a substrate by the lithographic process using the illumination and wherein the illumination is represented as a plurality of radiation intensity pixels and the patterning device pattern is represented as a plurality of pattern pixels;
iteratively adjusting, by a hardware computer system, gray scale values of the plurality of radiation intensity pixels and values of the plurality of pattern pixels, until a performance metric of the lithographic process is suitably configured with respect to both the illumination and the patterning device pattern; and
producing electronic data corresponding to the respective adjusted configurations of the illumination and the patterning device pattern for which the performance metric of the lithographic process is suitably configured, the electronic data for enabling setup and/or modification of an aspect of the lithographic process and/or for enabling creation and/or modification a physical object or apparatus for use in the lithographic process.
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Abstract
The present disclosure relates to lithographic apparatuses and processes, and more particularly to tools for optimizing illumination sources and masks for use in lithographic apparatuses and processes. According to certain aspects, the present disclosure significantly speeds up the convergence of the optimization by allowing direct computation of gradient of the cost function. According to other aspects, the present disclosure allows for simultaneous optimization of both source and mask, thereby significantly speeding the overall convergence. According to still further aspects, the present disclosure allows for free-form optimization, without the constraints required by conventional optimization techniques.
29 Citations
20 Claims
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1. A method for optimizing a lithographic process having an illumination and a patterning device pattern, the method comprising:
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obtaining respective initial descriptions of an illumination and a patterning device pattern for a lithographic process, wherein the patterning device pattern is to be imaged onto a substrate by the lithographic process using the illumination and wherein the illumination is represented as a plurality of radiation intensity pixels and the patterning device pattern is represented as a plurality of pattern pixels; iteratively adjusting, by a hardware computer system, gray scale values of the plurality of radiation intensity pixels and values of the plurality of pattern pixels, until a performance metric of the lithographic process is suitably configured with respect to both the illumination and the patterning device pattern; and producing electronic data corresponding to the respective adjusted configurations of the illumination and the patterning device pattern for which the performance metric of the lithographic process is suitably configured, the electronic data for enabling setup and/or modification of an aspect of the lithographic process and/or for enabling creation and/or modification a physical object or apparatus for use in the lithographic process. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method comprising:
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receiving descriptions of an illumination and a patterning device pattern, the patterning device pattern to be imaged by a lithographic process using the illumination; until the illumination and patterning device pattern are suitably configured for a performance metric of the lithographic process, selectively repeating; evaluating, by a hardware computer system, a cost function that is a function of both the illumination and the patterning device pattern the cost function, calculating, by the hardware computer system, a derivative of the cost function with respect to the illumination and a derivative of the cost function with respect to the patterning device pattern, and reconfiguring, by the hardware computer system, the illumination and patterning device pattern descriptions based on both the calculated derivatives; and producing electronic data corresponding to the respective reconfigurations of the illumination and the patterning device pattern, the electronic data for enabling setup and/or modification of an aspect of the lithographic process and/or for enabling creation and/or modification a physical object or apparatus for use in the lithographic process. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19)
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20. A non-transitory computer readable medium having instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
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obtain respective initial descriptions of an illumination and a patterning device pattern for a lithographic process, wherein the patterning device pattern is to be imaged onto a substrate by the lithographic process using the illumination and wherein the illumination is represented as a plurality of radiation intensity pixels and the patterning device pattern is represented as a plurality of pattern pixels; iteratively adjust gray scale values of the plurality of radiation intensity pixels and values of the plurality of pattern pixels, until a performance metric of the lithographic process is suitably configured with respect to both the illumination and the patterning device pattern; and produce electronic data corresponding to the respective adjusted configurations of the illumination and the patterning device pattern for which the performance metric of the lithographic process is suitably configured, the electronic data for enabling setup and/or modification of an aspect of the lithographic process and/or for enabling creation and/or modification a physical object or apparatus for use in the lithographic process.
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Specification