Semiconductor structures
First Claim
1. A semiconductor structure, comprising:
- a semiconductor substrate including fin structures, the fin structures including a plurality of first fin structures having a first width and a plurality of second fin structures, wherein;
the second fin structure has a second width at a lower portion and a third width at an upper portion, andthe second width is greater than each of the first width and the third width; and
a first isolation film formed on the semiconductor substrate and between adjacent fin structures, wherein;
the first isolation film has a top surface lower than the fin structures, andthe upper portion of each second fin structure having the third width passes through the top surface of the first isolation film; and
a by-product layer formed on a top surface of the lower portion of the second fin structures, wherein the by-product layer has a top surface coplanar with the top surface of the first isolation film and a side surface coplanar with a side surface of the lower portion of the second fin structures.
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Abstract
Semiconductor structure is provided. An exemplary semiconductor structure includes a semiconductor substrate including fin structures. The fin structures include a plurality of first fin structures having a first width and a plurality of second fin structures. The second fin structure has a second width at a lower portion and a third width at an upper portion, and the second width is greater than each of the first width and the third width. The semiconductor structure includes a first isolation film formed on the semiconductor substrate and between adjacent fin structures. The first isolation film has a top surface lower than the fin structures. The upper portion of each second fin structure having the third width passes through the top surface of the first isolation film.
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Citations
10 Claims
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1. A semiconductor structure, comprising:
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a semiconductor substrate including fin structures, the fin structures including a plurality of first fin structures having a first width and a plurality of second fin structures, wherein; the second fin structure has a second width at a lower portion and a third width at an upper portion, and the second width is greater than each of the first width and the third width; and a first isolation film formed on the semiconductor substrate and between adjacent fin structures, wherein; the first isolation film has a top surface lower than the fin structures, and the upper portion of each second fin structure having the third width passes through the top surface of the first isolation film; and a by-product layer formed on a top surface of the lower portion of the second fin structures, wherein the by-product layer has a top surface coplanar with the top surface of the first isolation film and a side surface coplanar with a side surface of the lower portion of the second fin structures. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A semiconductor structure, comprising:
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a semiconductor substrate including fin structures, the fin structures including a plurality of first fin structures having a first width and a plurality of second fin structures, wherein; the second fin structure has a second width at a lower portion and a third width at an upper portion, and the second width is greater than each of the first width and the third width; a first isolation film formed on the semiconductor substrate and between adjacent fin structures, wherein; the first isolation film has a top surface lower than the fin structures, and the upper portion of each second fin structure having the third width passes through the top surface of the first isolation film; a by-product layer formed on a top surface of the lower portion of the second fin structures having the second width and on a sidewall of the upper portion of the second fin structures having the third width; a second isolation film on a top portion of the first isolation film, on a sidewall of the by-product layer, and having a top surface coplanar with the first isolation film; and a control layer between the first and second isolation films and, between the second isolation film and the by-product layer. - View Dependent Claims (9, 10)
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Specification