Systems and method for charge balanced semiconductor power devices with fast switching capability
First Claim
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1. A method of manufacturing a semiconductor device, comprising:
- performing a first implantation in a semiconductor layer via ion implantation, forming a first implantation region, wherein the semiconductor layer comprises a top epitaxial (epi) layer, wherein the top epi layer is disposed upon at least one epi layer having a first conductivity type that includes a plurality of charge balance (CB) regions having a second conductivity type to form at least one CB layer; and
performing a second implantation in the semiconductor layer via ion implantation, forming a second implantation region opposite the first implantation region, wherein the first and second implantation regions overlap with one another;
wherein the first and second implantation regions combine to form a connection region extending into the semiconductor layer to at least one of the plurality of CB regions of the at least one CB layer.
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Abstract
A method of manufacturing a semiconductor device including performing a first implantation in a semiconductor layer via ion implantation forming a first implantation region and performing a second implantation in the semiconductor layer via ion implantation forming a second implantation region. The first and second implantation overlap with one another and combine to form a connection region extending into the semiconductor layer by a predefined depth.
22 Citations
25 Claims
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1. A method of manufacturing a semiconductor device, comprising:
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performing a first implantation in a semiconductor layer via ion implantation, forming a first implantation region, wherein the semiconductor layer comprises a top epitaxial (epi) layer, wherein the top epi layer is disposed upon at least one epi layer having a first conductivity type that includes a plurality of charge balance (CB) regions having a second conductivity type to form at least one CB layer; and performing a second implantation in the semiconductor layer via ion implantation, forming a second implantation region opposite the first implantation region, wherein the first and second implantation regions overlap with one another; wherein the first and second implantation regions combine to form a connection region extending into the semiconductor layer to at least one of the plurality of CB regions of the at least one CB layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A charge balanced (CB) device, comprising:
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a device layer having a first conductivity type, wherein the device layer comprises a top region having a second conductivity type disposed in a top surface of the device layer; a first CB layer having the first conductivity type disposed adjacent to the device layer, wherein the first CB layer comprises a first plurality of CB regions having the second conductivity type; a first connection region comprising a connection region wherein a first implantation region and a second implantation region overlap with one another; the first implantation region formed by a first implantation adjacent the connection region; and the second implantation region formed by a second implantation adjacent the connection region, opposite the first implantation region; wherein the first connection region extends from the top region of the device layer to at least a first CB region of the first plurality of CB regions of the first CB layer. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18)
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19. A charge balanced (CB) device, comprising:
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at least one epitaxial (epi) layer having a first conductivity type that includes a plurality of charge balance (CB) regions having a second conductivity type to form at least one charge balance (CB) layer, wherein a thickness of each of the plurality of CB regions is less than a thickness of the at least one CB layer; a top epitaxial layer having the first conductivity type disposed adjacent to the at least one CB layer to form a device layer, wherein the device layer includes a top region having the second conductivity type; and a connection region comprising a connection region where a first implantation region and a second implantation region overlap with one another; a first region formed by the first implantation region adjacent the connection region; and a second region formed by the second implantation region adjacent the connection region, opposite the first region; wherein the connection region extends from the top region of the device layer to at least one of the plurality of CB regions of the at least one CB layer. - View Dependent Claims (20, 21, 22, 23, 24, 25)
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Specification