Mask pattern verification method
First Claim
1. A mask pattern verification method performed in a device including a processor, a memory, and a display, the method comprising:
- receiving circuit pattern data and optical proximity correction (OPC) condition data from an external device;
storing the circuit pattern data and the OPC condition data in the memory;
calculating, by the processor, mask pattern data based on OPC processing using the circuit pattern data and the OPC condition data;
storing the mask pattern data in the memory;
calculating, by the processor, an optical image and a resist image based on the mask pattern data;
storing the optical image and the resist image in the memory;
calculating, by the processor, a first feature amount regarding a first pattern of the resist image, using a plurality of algorithms;
comparing, by the processor, the first feature amount with a first threshold in each of the plurality of algorithms, and detecting the first pattern as a critical point candidate based on a result of the comparison between the first feature amount and the first threshold in each of the plurality of algorithms;
calculating, by the processor, a second feature amount based on a second pattern that is adjacent to the first pattern detected as the critical point candidate, using the plurality of algorithms;
comparing, by the processor, the second feature amount with a second threshold, and detecting a critical point based on a result of the comparison between the second feature amount and the second threshold;
selecting at least one of the plurality of algorithms; and
displaying, on the display, a detection result of the critical point corresponding to a selected algorithm.
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Abstract
According to one embodiment, a mask pattern verification method includes: calculating mask pattern data; calculating an optical image and a resist image; calculating a first feature amount and a second feature amount, using a plurality of algorithms; in each of the plurality of algorithms, comparing the first feature amount with a first threshold, and detecting a critical point candidate in a first pattern; in each of the plurality of algorithms, comparing the second feature amount with a second threshold, and detecting a critical point in the first pattern; and selecting at least one of the plurality of algorithms, and displaying a detection result of the critical point corresponding to a selected algorithm.
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Citations
16 Claims
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1. A mask pattern verification method performed in a device including a processor, a memory, and a display, the method comprising:
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receiving circuit pattern data and optical proximity correction (OPC) condition data from an external device; storing the circuit pattern data and the OPC condition data in the memory; calculating, by the processor, mask pattern data based on OPC processing using the circuit pattern data and the OPC condition data; storing the mask pattern data in the memory; calculating, by the processor, an optical image and a resist image based on the mask pattern data; storing the optical image and the resist image in the memory; calculating, by the processor, a first feature amount regarding a first pattern of the resist image, using a plurality of algorithms; comparing, by the processor, the first feature amount with a first threshold in each of the plurality of algorithms, and detecting the first pattern as a critical point candidate based on a result of the comparison between the first feature amount and the first threshold in each of the plurality of algorithms; calculating, by the processor, a second feature amount based on a second pattern that is adjacent to the first pattern detected as the critical point candidate, using the plurality of algorithms; comparing, by the processor, the second feature amount with a second threshold, and detecting a critical point based on a result of the comparison between the second feature amount and the second threshold; selecting at least one of the plurality of algorithms; and displaying, on the display, a detection result of the critical point corresponding to a selected algorithm. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification