Method of monitoring processing system for processing substrate
First Claim
1. A method of monitoring a processing system for processing a substrate, comprising:
- acquiring data from the processing system for a plurality of parameters in a first period of time, the data comprising a plurality of data values;
grouping the parameters into a plurality of sub-groups, each of the sub-groups comprising a plurality of correlated parameters;
constructing a principle components analysis (PCA) model from a first set of data values for the correlated parameters in a first one of the sub-groups;
determining a statistical quantity using the PCA model;
performing a prevention maintenance step to the processing system after the first period of time;
acquiring a second set of data values for the correlated parameters in the first one of the sub-groups from the processing system in a second period of time after performing the prevention maintenance step, wherein the second set of data values comprise a first group of data values and a second group of data values acquired subsequent to the first group of data values;
determining whether a current data value of the second group of data values exceeds an estimated statistical quantity or not, wherein the estimated statistical quantity is determined using a combination of precious data values of the second set of data values acquired in the second period of time and the PCA model, and the precious data values are at least one data value from the second group of data values; and
constructing an updated PCA model using a combination of the current data value, the data values acquired previously and the PCA model for determining an updated statistical quantity when the current data value does not exceed the estimated statistical quantity, wherein a process is controlled based on the statistical quantity or the updated statistical quantity.
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Abstract
A method of monitoring a processing system for processing a substrate is provided. The method includes the following steps: acquiring data from the processing system for a plurality of parameters, the data including a plurality of data values; grouping the parameters into a plurality of sub-groups, each of the sub-groups including a plurality of correlated parameters; constructing a principle components analysis (PCA) model from the data values for the correlated parameters in a first one of the sub-groups, including normalizing the data values in the first one of the sub-groups with a first weighting factor and a second weighting factor, wherein the first weighting factor is different from the second weighting factor; and determining a statistical quantity using the PCA model.
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Citations
9 Claims
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1. A method of monitoring a processing system for processing a substrate, comprising:
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acquiring data from the processing system for a plurality of parameters in a first period of time, the data comprising a plurality of data values; grouping the parameters into a plurality of sub-groups, each of the sub-groups comprising a plurality of correlated parameters; constructing a principle components analysis (PCA) model from a first set of data values for the correlated parameters in a first one of the sub-groups; determining a statistical quantity using the PCA model; performing a prevention maintenance step to the processing system after the first period of time; acquiring a second set of data values for the correlated parameters in the first one of the sub-groups from the processing system in a second period of time after performing the prevention maintenance step, wherein the second set of data values comprise a first group of data values and a second group of data values acquired subsequent to the first group of data values; determining whether a current data value of the second group of data values exceeds an estimated statistical quantity or not, wherein the estimated statistical quantity is determined using a combination of precious data values of the second set of data values acquired in the second period of time and the PCA model, and the precious data values are at least one data value from the second group of data values; and constructing an updated PCA model using a combination of the current data value, the data values acquired previously and the PCA model for determining an updated statistical quantity when the current data value does not exceed the estimated statistical quantity, wherein a process is controlled based on the statistical quantity or the updated statistical quantity. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of monitoring a processing system for processing a substrate, comprising:
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acquiring data from the processing system for a plurality of parameters in a first period of time, the data comprising a plurality of data values; grouping the parameters into a plurality of sub-groups, each of the sub-groups comprising a plurality of correlated parameters; constructing a principle components analysis (PCA) model from a first set of data values for the correlated parameters in a first one of the sub-groups; determining a statistical quantity using the PCA model; performing a prevention maintenance step to the processing system after the first period of time; acquiring a second set of data values for the correlated parameters in the first one of the sub-groups from the processing system in a second period of time after performing the prevention maintenance step, wherein the second set of data values comprise a first group of data values and a second group of data values acquired subsequent to the first group of data values; determining whether a current data value of the second group of data values exceeds an estimated statistical quantity or not, wherein the estimated statistical quantity is determined using a combination of the data values of the second set of data values previously acquired in the second period of time and the PCA model; and constructing an updated PCA model using a combination of the current data value, the data values acquired previously and the PCA model for determining an updated statistical quantity when the current data value does not exceed the estimated statistical quantity, wherein a process is controlled based on the statistical quantity or the updated statistical quantity.
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Specification