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Electron beam resist composition

  • US 10,613,441 B2
  • Filed: 11/20/2018
  • Issued: 04/07/2020
  • Est. Priority Date: 08/06/2014
  • Status: Active Grant
First Claim
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1. An antiscattering resist composition for fabricating an integrated circuit die or an integrated circuit wafer, the composition comprising an anti-scattering compound, wherein the antiscattering compound is a polymetallic metal-organic complex comprising a primary metal complex (PMC).

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