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Plasma generating method

  • US 10,615,005 B2
  • Filed: 04/12/2019
  • Issued: 04/07/2020
  • Est. Priority Date: 04/12/2018
  • Status: Active Grant
First Claim
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1. A plasma generating method comprising:

  • providing a plasma processing apparatus including a chamber;

    a radio-frequency power supply;

    an electrode electrically connected to the radio-frequency power supply to generate plasma within the chamber; and

    a matching device provided between the radio-frequency power supply and the electrode in order to match a load side impedance of the radio-frequency power supply with an output impedance of the radio-frequency power supply, the matching device including a plurality of first series circuits connected in parallel to each other and each including a capacitor and a switching element connected to the capacitor in series, and a plurality of second series circuits connected in parallel to each other and each including a capacitor and a switching element connected to the capacitor in series;

    supplying radio-frequency power to the electrode via the matching device from the radio-frequency power supply in order to generate plasma within the chamber;

    determining whether or not plasma is generated within the chamber from one or more parameters reflecting plasma generation within the chamber during the supplying the radio-frequency power;

    matching the load side impedance with the output impedance of the radio-frequency power by the matching device; and

    when it is determined that plasma is not generated within the chamber in the determining, adjusting a frequency of the radio-frequency power output from the radio-frequency power supply so as to set the load side reactance of the radio-frequency power supply to zero or to bring the load side reactance close to zero.

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