Electro-optical device and electronic apparatus
First Claim
1. An electro-optical device comprising:
- a first substrate;
a pixel electrode provided on one surface side of the first substrate;
a scanning line provided in a layer between the first substrate and the pixel electrode, the scanning line extending in a first direction;
a data line provided in a layer between the first substrate and the pixel electrode, the data line extending in a second direction intersecting the scanning line;
a transistor including a semiconductor layer extending in each of the first direction and the second direction;
a first light shielding layer provided in a layer between the first substrate and the transistor, the first light shielding layer overlapping in a plan view with the semiconductor layer;
a first conductive layer provided in a layer between the transistor and the pixel electrode, the first conductive layer being supplied with a constant potential; and
a first interlayer insulating film provided in a layer between the first light shielding layer and the first conductive layer, whereinthe first light shielding layer is electrically coupled to the first conductive layer via a first contact hole and a second contact hole provided in the first interlayer insulating film in a manner extending along the semiconductor layer,at least a source/drain region in the semiconductor layer extends in a plan view between the first contact hole and the second contact hole,a first light shielding wall formed of a light shielding conductive material is provided on an inner wall of the first contact hole,a second light shielding wall formed of a light shielding conductive material is provided on an inner wall of the second contact hole, andat least a semiconductor layer portion in the semiconductor layer overlaps with an end portion on a source/drain region side of a gate electrode of the transistor via a gate insulating layer, the semiconductor layer onion being located between the first light shielding wall and the second light shielding wall,the electro-optical device further comprising;
a second light shielding layer overlapping in a plan view with the semiconductor layer in a layer between the first light shielding layer and the semiconductor layer,a third contact hole penetrating through a second interlayer insulating film interposed between the second light shielding layer and the gate electrode on an opposite side of the semiconductor layer portion to the source/drain region in a region overlapping in a plan view with the scanning line, anda third light shielding wall formed of a conductive material covering an inner wall of the third contact hole.
1 Assignment
0 Petitions
Accused Products
Abstract
In an element substrate of an electro-optical device, a semiconductor layer of a transistor has an L shape bending to overlap with both a scanning line and a data line. A first light shielding layer overlaps with a lower layer side of the semiconductor layer. A first light shielding wall and a second light shielding wall are provided on both sides of a semiconductor layer portion between a channel region and a second source/drain region (drain region) of the semiconductor layer. The first light shielding wall and the second light shielding wall to which a constant potential is applied prevent the semiconductor layer portion from being electrically affected even when the first light shielding wall and the second light shielding wall come close to the semiconductor layer portion.
12 Citations
14 Claims
-
1. An electro-optical device comprising:
-
a first substrate; a pixel electrode provided on one surface side of the first substrate; a scanning line provided in a layer between the first substrate and the pixel electrode, the scanning line extending in a first direction; a data line provided in a layer between the first substrate and the pixel electrode, the data line extending in a second direction intersecting the scanning line; a transistor including a semiconductor layer extending in each of the first direction and the second direction; a first light shielding layer provided in a layer between the first substrate and the transistor, the first light shielding layer overlapping in a plan view with the semiconductor layer; a first conductive layer provided in a layer between the transistor and the pixel electrode, the first conductive layer being supplied with a constant potential; and a first interlayer insulating film provided in a layer between the first light shielding layer and the first conductive layer, wherein the first light shielding layer is electrically coupled to the first conductive layer via a first contact hole and a second contact hole provided in the first interlayer insulating film in a manner extending along the semiconductor layer, at least a source/drain region in the semiconductor layer extends in a plan view between the first contact hole and the second contact hole, a first light shielding wall formed of a light shielding conductive material is provided on an inner wall of the first contact hole, a second light shielding wall formed of a light shielding conductive material is provided on an inner wall of the second contact hole, and at least a semiconductor layer portion in the semiconductor layer overlaps with an end portion on a source/drain region side of a gate electrode of the transistor via a gate insulating layer, the semiconductor layer onion being located between the first light shielding wall and the second light shielding wall, the electro-optical device further comprising; a second light shielding layer overlapping in a plan view with the semiconductor layer in a layer between the first light shielding layer and the semiconductor layer, a third contact hole penetrating through a second interlayer insulating film interposed between the second light shielding layer and the gate electrode on an opposite side of the semiconductor layer portion to the source/drain region in a region overlapping in a plan view with the scanning line, and a third light shielding wall formed of a conductive material covering an inner wall of the third contact hole. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
a common electrode formed on a surface on a first substrate side of the second substrate; and an electro-optical layer provided between the first substrate and the second substrate, wherein the electric potential serves as a common electric potential applied to the common electrode.
-
-
13. An electronic apparatus comprising the electro-optical device according to claim 1.
-
14. An electro-optical device comprising:
-
a first substrate; a pixel electrode provided on one surface side of the first substrate; a scanning line provided in a layer between the first substrate and the pixel electrode, the scanning line extending in a first direction; a data line provided in a layer between the first substrate and the pixel electrode, the data line extending in a second direction intersecting the scanning line; a transistor including a semiconductor layer extending in each of the first direction and the second direction; a first light shielding layer provided in a layer between the first substrate and the transistor, the first light shielding layer overlapping in a plan view with the semiconductor layer; a first conductive layer provided in a layer between the transistor and the pixel electrode, the first conductive layer being supplied with a constant potential; and a first interlayer insulating film provided in a layer between the first light shielding layer and the first conductive layer, wherein the first light shielding layer is electrically coupled to the first conductive layer via a first contact hole and a second contact hole provided in the first interlayer insulating film in a manner extending along the semiconductor layer, at least a source/drain region in the semiconductor layer extends in a plan view between the first contact hole and the second contact hole, a first light shielding wall formed of a light shielding conductive material is provided on an inner wall of the first contact hole, a second light shielding wall formed of a light shielding conductive material is provided on an inner wall of the second contact hole, and at least a semiconductor layer portion in the semiconductor layer overlaps with an end portion on a source/drain region side of a gate electrode of the transistor via a gate insulating layer, the semiconductor layer portion being located between the first light shielding wall and the second light shielding wall, the electro-optical device further comprising; a second conductive layer provided in a layer between the first conductive layer and the pixel electrode, wherein the second interlayer insulating film is provided with a fifth contact hole penetrating through a fourth interlayer insulating film in the second interlayer insulating film to partially communicate with the first contact hole, the fourth interlayer insulating film being interposed between the first conductive layer and the second conductive layer, and a sixth contact hole penetrating through the fourth interlayer insulating film to partially communicate with the second contact hole, and the first light shielding wall is integrally provided from the fifth contact hole to the first contact hole, and the second light shielding wall is integrally provided from the sixth contact hole to the second contact hole.
-
Specification