Substrate processing apparatus

• US 10,620,648 B2
• Filed: 05/23/2019
• Issued: 04/14/2020
• Est. Priority Date: 05/14/2018
• Status: Active Grant

• Current Assignee: ASM IP Holding B.V. (ASM International NV)
• Original Assignee: ASM IP Holding B.V. (ASM International NV)
• Inventors: Ninh, Phuc Hong, Makino, Tsutomu
• Primary Examiner(s): Le, Tung X
• Application Number:
  US16/420,979
• Publication Number:
  US 20190346868A1
• Time in Patent Office: 327 Days
• Field of Search: 31511121, 363 16, 363 89, 323283
• CPC Class Codes: G05F 1/56 using semiconductor devices in series with the load as final control devices G05F1/461 takes precedence
• CPC Class Codes: H02H 9/02 responsive to excess current current limitation for voltage regulators G05F1/573; disconnection after limiting H02H3/025
• CPC Class Codes: H02M 3/33515 with digital control
• CPC Class Codes: H02M 3/33523 with galvanic isolation between input and output of both the power stage and the feedback loop
• CPC Class Codes: H02M 3/33576 having at least one active switching element at the secondary side of an isolation transformer

Abstract

Examples of an insulation system include a digital isolator for receiving supply of a first power supply on an input side thereof and receiving supply of a second power supply on an output side thereof, and an output adjusting unit for receiving supply of the second power supply, directly outputting an output of the digital isolator when a voltage of the second power supply is larger than a predetermined voltage, and stopping data output irrespective of the output of the digital isolator when the voltage of the second power supply is smaller or equal to the predetermined voltage.

Claims

1. A substrate processing apparatus comprising:

a module controller;

an IO board configured to receive an instruction from the module controller; and

a device configured to operate based on an instruction from the IO board, wherein the IO board includes a digital isolator configured to receive supply of a first power supply on an input side of the digital isolator and configured to receive supply of a second power supply on an output side of the digital isolator, and an output adjusting unit configured to receive supply of the second power supply, configured to directly output an output of the digital isolator when a voltage of the second power supply is larger than a predetermined voltage, and configured to stop data output irrespective of the output of the digital isolator when the voltage of the second power supply is smaller or equal to the predetermined voltage.

2. The substrate processing apparatus according to claim 1, wherein the device is a gas supply device configured to supply gas to a substrate, and ON/OFF of the gas supply device is controlled based on an instruction from the IO board.

3. The substrate processing apparatus according to claim 1, wherein the device is an RF generator configured to subject a substrate to plasma processing, and ON/OFF of the RF generator is controlled based on an instruction from the IO board.