×

Enhanced digital light processing-based mask projection stereolithography method and apparatus

  • US 10,639,843 B2
  • Filed: 08/01/2017
  • Issued: 05/05/2020
  • Est. Priority Date: 12/30/2015
  • Status: Active Grant
First Claim
Patent Images

1. An enhanced digital light processing-based mask projection stereolithography method, wherein comprising the following steps:

  • slicing a model of a to-be-prototyped object into layers, converting a layer into a bitmap, and further dividing the layer into a main body area and boundary filling areas;

    prototyping, by using a digital light processing unit, the corresponding main body area of the layer of the to-be-prototyped object; and

    prototyping by using a laser marking unit, the corresponding boundary filling areas of the layer of the to-be-prototyped object;

    wherein the steps of slicing the model of the to-be-prototyped object into layers, converting the layer into the bitmap, and further dividing the layer into the main body area and boundary filling areas comprises;

    performing lamination and slicing processing on a three-dimensional model of the to-be-prototyped object to obtain a series of vector sections composed of closed loops;

    mapping the vector sections to an image area of a corresponding resolution of the digital light processing unit,converting pixels located inside the closed loops into the bitmap, where the bitmap is defined as the main body area;

    recording coordinates of a pixel intersecting with a boundary of the closed loops and intersecting points between the pixel and the boundary of the closed loops;

    obtaining pixel parts inside the closed loops of a pixel according to the coordinates and the intersecting points, where each of the pixel parts is less than a size of one pixel, and the pixel parts are defined as the boundary filling areas;

    the boundary filling areas are remaining in a vector diagram form.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×