Film-forming composition and manufacturing method of laminate

• US 10,640,670 B2
• Filed: 11/30/2018
• Issued: 05/05/2020
• Est. Priority Date: 06/17/2016
• Status: Active Grant

• Current Assignee: Fujifilm Corporation (Fujifilm Holdings Corporation)
• Original Assignee: Fujifilm Corporation (Fujifilm Holdings Corporation)
• Inventors: Hama, Takeshi, Hatanaka, Yusuke, Koito, Naoki, Nakamichi, AKi
• Primary Examiner(s): Nguyen, Vu A
• Application Number:
  US16/205,249
• Publication Number:
  US 20190100674A1
• Time in Patent Office: 522 Days
• CPC Class Codes: B32B 9/00 Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
• CPC Class Codes: C08G 77/02 Polysilicates
• CPC Class Codes: C08K 3/36 Silica
• CPC Class Codes: C08K 5/42 Sulfonic acids; Derivatives thereof
• CPC Class Codes: C08L 33/02 Homopolymers or copolymers of acids; Metal or ammonium salts thereof
• CPC Class Codes: C08L 33/06 of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
• CPC Class Codes: C09D 133/00 Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
• CPC Class Codes: C09D 133/02 Homopolymers or copolymers of acids; Metal or ammonium salts thereof
• CPC Class Codes: C09D 175/04 Polyurethanes
• CPC Class Codes: C09D 183/02 Polysilicates
• CPC Class Codes: C09D 5/24 Electrically-conducting paints conductive materials H01B1/00

Abstract

Provided are a film-forming composition containing a hydrolysate of a siloxane compound represented by Formula (1), silica particles, a ketone-based solvent, and water, and a manufacturing method of a laminate. In Formula (1), R¹, R², R³, and R⁴ each independently represent a monovalent organic group having 1 to 6 carbon atoms. n represents an integer of 2 to 20.

Claims

1. A film-forming composition comprising:

(a) a hydrolysate of a siloxane compound represented by Formula (1);

(b) silica particles;

(c) a ketone-based solvent;

(d) at least one kind of solvent selected from the group consisting of an alcohol-based solvent, a glycol ether-based solvent, and an ether-based solvent; and

(e) water,

2. The film-forming composition according to claim 1, further comprising:

at least one kind of resin selected from the group consisting of a urethane-based resin and a (meth)acrylic resin.

3. The film-forming composition according to claim 2,

wherein the (meth)acrylic resin is a polyacrylic acid.

4. A manufacturing method of a laminate, comprising:

forming a film by applying the film-forming composition according to claim 1 onto a substrate.

5. The manufacturing method of a laminate according to claim 4,

wherein the film-forming composition further comprises at least one kind of resin selected from the group consisting of a urethane-based resin and a (meth)acrylic resin.

6. The manufacturing method of a laminate according to claim 5,

wherein the (meth)acrylic resin is a polyacrylic acid.

7. The manufacturing method of a laminate according to claim 4,

wherein the substrate is a polycarbonate substrate or a polymethyl methacrylate substrate.