Integrated active devices with improved optical coupling to planarized dielectric waveguides

• US 10,641,959 B1
• Filed: 11/07/2019
• Issued: 05/05/2020
• Est. Priority Date: 01/23/2019
• Status: Active Grant

• Current Assignee: Nexus Photonics, LLC
• Original Assignee: Nexus Photonics, LLC
• Inventors: Park, Hyundai
• Primary Examiner(s): Rahll, Jerry
• Application Number:
  US16/677,050
• Time in Patent Office: 180 Days
• Field of Search: None
• CPC Class Codes: G02B 6/12007 forming wavelength selective elements, e.g. multiplexer, demultiplexer
• CPC Class Codes: G02B 6/1228 Tapered waveguides, e.g. integrated spot-size transformers for coupling with fibres G02B6/305
• CPC Class Codes: G02B 6/13 Integrated optical circuits characterised by the manufacturing method
• CPC Class Codes: G02B 6/14 Mode converters

Abstract

An optical device comprises first, second and third elements fabricated on a common substrate. The first element comprises an active waveguide structure supporting a first optical mode, the second element comprises a passive waveguide structure, characterized by a planar top surface, supporting a second optical mode, and the third element, at least partly butt-coupled to the first element, comprises an intermediate waveguide structure. If the first optical mode differs from the second optical mode by more than a predetermined amount, a tapered waveguide structure in at least one of the second and third elements facilitates efficient adiabatic transformation between the first optical mode and the second optical mode. Mutual alignments of the first, second and third elements are defined using lithographic alignment marks that facilitate precise alignment between layers formed during processing steps of fabricating the first, second and third elements.

Claims

1. A device comprising:

first, second and third elements fabricated on a common substrate;

wherein the first element comprises an active waveguide structure supporting a first optical mode, the second element, characterized by a planarized top surface, comprises a passive waveguide structure supporting a second optical mode, and the third element, at least partly butt-coupled to the first element, comprises an intermediate waveguide structure;

wherein, if the first optical mode differs from the second optical mode by more than a predetermined amount, a tapered waveguide structure in at least one of the second and third elements facilitates efficient adiabatic transformation between the first optical mode and the second optical mode; and

wherein mutual alignments of the first, second and third elements are defined using lithographic alignment marks that facilitate precise alignment between layers formed during processing steps of fabricating the first, second and third elements.

2. The device of claim 1, additionally comprising:

a lower cladding layer, overlying the common substrate, and underlying the first, second and third elements;

wherein the active waveguide structure, the passive waveguide structure, and the intermediate waveguide structure comprise waveguide core materials characterized by first, second, and third refractive indices respectively; and

wherein the lower cladding layer is characterized by a fourth refractive index lower than each of the first, second and third refractive indices.

3. The device of claim 2, additionally comprising:

an upper cladding layer characterized by a fifth refractive index, the upper cladding layer overlying at least one of the second element and the third element,

wherein, if the upper cladding layer overlies the second element, the fifth refractive index is lower than the second refractive index; and

wherein, if the upper cladding layer overlies the third element, the fifth refractive index is lower than the third refractive index.

4. The device of claim 1,

wherein a part of the second element underlies the first element;

wherein the first optical mode has an evanescent field partly residing in the second element; and

wherein the part of the second element underlying the part of the first element is patterned to form a wavelength selective structure.

5. The device of claim 1,

wherein the first element is in direct contact with the common substrate, the common substrate providing at least one of heatsinking and an electrical interface.

6. The device of claim 1, further comprising:

an anti-reflective coating layer between the first and third elements.

7. The device of claim 1, further comprising:

a high reflectivity coating layer between the first and third elements.

8. The device of claim 1,

wherein at least one of:

the first interface between first and second elements, and the second interface between second and third elements, is angled at an angle optimized to minimize reflections.

9. The device of claim 8, further comprising:

an anti-reflective coating layer deposited on the at least one angled interface.

10. The device of claim 1,

wherein the active waveguide structure in the first element comprises an optical source;

and

wherein optical propagation through the device occurs primarily in a direction from the active waveguide structure to the passive waveguide structure via the intermediate waveguide structure.

11. The device of claim 1,

wherein the active waveguide structure in the first element comprises a photodetector;

and

wherein optical propagation through the device occurs primarily in a direction from the passive waveguide structure to the active waveguide structure via the intermediate waveguide structure.

12. A method for making a device;

the method comprising;

forming a first element, comprising a dielectric material, on a substrate;

defining a waveguide, configured to support a first optical mode, in the first element;

planarizing a top surface of the first element;

attaching a second element comprising an active material to the planarized top surface of the first element;

defining a waveguide configured to support a second optical mode in the second element where its position relative to the first element is defined by lithographic alignment marks;

forming electrical contacts in the second element; and

forming, on the substrate, a third element between and in contact with the first and second elements, the position of the third element relative to the first and second element being defined by lithographic alignment marks; and

defining an intermediate waveguide in the third element, the intermediate waveguide element being configured to facilitate transformation between the first and second optical modes if the first optical mode differs from the second optical mode by more than a predetermined amount;

wherein the third element is at least partly butt-coupled to the second element.

13. The method of claim 12, wherein the active material is capable of light generation when electrically pumped.

14. The method of claim 12, wherein the active material is capable of light detection, delivering an electrical output in response to incident light.

15. The method of claim 12,

wherein defining at least one of the active, passive, and intermediate waveguides comprises forming a lower cladding layer, overlying the common substrate, and underlying the first, second and third elements.

16. The method of claim 12,

wherein defining at least one of the active, passive, and intermediate waveguides comprises forming an upper cladding layer.

17. The method of claim 12,

wherein defining at least one of the active, passive, and intermediate waveguides comprises forming a lower cladding layer, the lower cladding layer overlying the substrate and underlying the first, second and third elements.

18. The method of claim 12,

wherein planarizing the top surface comprises depositing a layer of an additional material on the top surface and in any gaps formed in the first element.

19. The method of claim 18,

wherein planarizing top surface additionally comprises thinning the deposited layer.

20. The method of claim 19,

wherein thinning the deposited layer comprises chemical mechanical polishing.