Patterning device cooling apparatus
First Claim
1. A patterning apparatus for a lithographic apparatus, the patterning apparatus comprising:
- a patterning device support structure configured to support a patterning device having a planar surface;
a first gas outlet configured to provide a first gas flow over the planar surface in use with a directional component parallel to the planar surface, the first gas outlet configured to be connected to a gas supply and control system;
a second gas outlet configured to provide a second gas flow over the planar surface in use with a directional component parallel to the planar surface, the second gas outlet configured to be connected to the gas supply and control system,wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface and the first and second gas outlets are arranged to provide their respective gas flows to be in contact with the planar surface in use.
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Accused Products
Abstract
A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.
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Citations
20 Claims
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1. A patterning apparatus for a lithographic apparatus, the patterning apparatus comprising:
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a patterning device support structure configured to support a patterning device having a planar surface; a first gas outlet configured to provide a first gas flow over the planar surface in use with a directional component parallel to the planar surface, the first gas outlet configured to be connected to a gas supply and control system; a second gas outlet configured to provide a second gas flow over the planar surface in use with a directional component parallel to the planar surface, the second gas outlet configured to be connected to the gas supply and control system, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface and the first and second gas outlets are arranged to provide their respective gas flows to be in contact with the planar surface in use. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A patterning apparatus for a lithographic apparatus, the patterning apparatus comprising:
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a patterning device support structure configured to support a patterning device having a planar surface; a first gas outlet configured to provide a first gas flow over the planar surface in use with a directional component parallel to the planar surface; a second gas outlet configured to provide a second gas flow over the planar surface in use with a directional component parallel to the planar surface, the second gas outlet arranged a different distance perpendicular to the planar surface than the first gas outlet; and a third gas outlet configured to provide a further gas flow over the planar surface, wherein at least the first gas outlet and the second gas outlet are provided on a same side of the patterning device in plan view and the third gas outlet is arranged on another side of the patterning device in plan view, the third gas outlet configured to provide the further gas flow with a directional component in a substantially opposite direction to the directional component of the gas exiting the first gas outlet and/or the second gas outlet, wherein the first, second and third gas outlets are arranged to provide their respective gas flows to be in contact with the planar surface in use. - View Dependent Claims (10, 11, 12, 13, 14)
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15. A patterning apparatus for a lithographic apparatus, the patterning apparatus comprising:
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a patterning device support structure configured to support a patterning device having a planar surface; a first gas outlet configured to provide a first gas flow over the planar surface in use with a directional component parallel to the planar surface; a second gas outlet configured to provide a second gas flow over the planar surface in use with a directional component parallel to the planar surface, the second gas outlet is further away from the planar surface than the first gas outlet and the second gas outlet is configured to provide the second gas flow at an incline to the planar surface, wherein the first and second gas outlets are arranged to provide their respective gas flows to be in contact with the planar surface in use, and wherein the first and second gas outlets are arranged such that separately controlled gas flows can be provided respectively to the first and second gas outlets. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification