Patterning device cooling apparatus

• US 10,642,166 B2
• Filed: 07/22/2019
• Issued: 05/05/2020
• Est. Priority Date: 04/04/2016
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Nakibo{hacek over (g)}lu, Gunes, Baker, Lowell Lane, Bloks, Ruud Hendrikus Martinus Johannes, Cekli, Hakki Ergun, Schultz, Geoffrey Alan, Van Bokhoven, Laurentius Johannes Adrianus, Van Boxtel, Frank Johannes Jacobus, Van Damme, Jean-Philippe Xavier, Ward, Christopher Charles
• Primary Examiner(s): Iacoletti, Michelle M
• Application Number:
  US16/518,098
• Publication Number:
  US 20190346777A1
• Time in Patent Office: 288 Days
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Abstract

A patterning apparatus for a lithographic apparatus, the patterning apparatus including a patterning device support structure configured to support a patterning device having a planar surface; a patterning device conditioning system including a first gas outlet configured to provide a first gas flow over the planar surface in use and a second gas outlet configured to provide a second gas flow over the planar surface in use, wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface; and a control system configured to independently control a first momentum of gas exiting the first gas outlet and a second momentum of gas exiting the second gas outlet or to independently vary the first gas flow and/or the second gas flow over the planar surface of the patterning device.

Claims

1. A patterning apparatus for a lithographic apparatus, the patterning apparatus comprising:

a patterning device support structure configured to support a patterning device having a planar surface;

a first gas outlet configured to provide a first gas flow over the planar surface in use with a directional component parallel to the planar surface, the first gas outlet configured to be connected to a gas supply and control system;

a second gas outlet configured to provide a second gas flow over the planar surface in use with a directional component parallel to the planar surface, the second gas outlet configured to be connected to the gas supply and control system,

wherein the first gas outlet and the second gas outlet are arranged at different distances perpendicular to the planar surface and the first and second gas outlets are arranged to provide their respective gas flows to be in contact with the planar surface in use.

2. The patterning apparatus of claim 1, wherein the second gas outlet is further away from the planar surface than the first gas outlet and the second gas outlet is configured to provide the second gas flow at an incline to the planar surface.

3. The patterning apparatus of claim 1, comprising a further gas outlet configured to provide a further gas flow over the planar surface, wherein at least the first gas outlet and the second gas outlet are provided on a same side of the patterning device in plan view and the further gas outlet is arranged on another side of the patterning device in plan view, the further gas outlet configured to provide the further gas flow with a directional component in a substantially opposite direction to the directional component of the gas exiting the first gas outlet and/or the second gas outlet.

4. The patterning apparatus of claim 1, comprising a further gas outlet configured to provide a further gas flow over the planar surface, the further gas outlet at a different distance perpendicular to the planar surface of the patterning device than the first and second gas outlets.

5. The patterning apparatus of claim 4, wherein the further gas outlet is configured to provide the further gas flow at an incline to the planar surface.

6. The patterning apparatus of claim 1, wherein at least the first gas outlet and the second gas outlet are provided on a same side of the patterning device in plan view.

7. A lithographic apparatus configured to transfer a pattern onto a substrate using a patterning device, the lithographic apparatus comprising the patterning apparatus of claim 1.

8. The patterning apparatus of claim 1, wherein the first and second gas outlets are arranged such that a separately controlled gas flow can be provided to the first gas outlet than the second gas outlet.

9. A patterning apparatus for a lithographic apparatus, the patterning apparatus comprising:

a patterning device support structure configured to support a patterning device having a planar surface;

a first gas outlet configured to provide a first gas flow over the planar surface in use with a directional component parallel to the planar surface;

a second gas outlet configured to provide a second gas flow over the planar surface in use with a directional component parallel to the planar surface, the second gas outlet arranged a different distance perpendicular to the planar surface than the first gas outlet; and

a third gas outlet configured to provide a further gas flow over the planar surface, wherein at least the first gas outlet and the second gas outlet are provided on a same side of the patterning device in plan view and the third gas outlet is arranged on another side of the patterning device in plan view, the third gas outlet configured to provide the further gas flow with a directional component in a substantially opposite direction to the directional component of the gas exiting the first gas outlet and/or the second gas outlet,

wherein the first, second and third gas outlets are arranged to provide their respective gas flows to be in contact with the planar surface in use.

10. The patterning apparatus of claim 9, wherein the second gas outlet is further away from the planar surface than the first gas outlet and the second gas outlet is configured to provide the second gas flow at an incline to the planar surface.

11. The patterning apparatus of claim 9, comprising a further gas outlet than the first, second and third outlets, the further gas outlet configured to provide a further gas flow over the planar surface, the further gas outlet at a different distance perpendicular to the planar surface of the patterning device than the first and second gas outlets.

12. The patterning apparatus of claim 11, wherein the further gas outlet is configured to provide the further gas flow at an incline to the planar surface.

13. The patterning apparatus of claim 9, wherein the first gas outlet and/or second gas outlet comprise a plurality of openings, each configured to provide a separate sub-flow of the respective first and/or second gas flow, the openings extending along a same side of the patterning device in plan view.

14. A lithographic apparatus configured to transfer a pattern onto a substrate using a patterning device, the lithographic apparatus comprising the patterning apparatus of claim 9.

15. A patterning apparatus for a lithographic apparatus, the patterning apparatus comprising:

a patterning device support structure configured to support a patterning device having a planar surface;

a first gas outlet configured to provide a first gas flow over the planar surface in use with a directional component parallel to the planar surface;

a second gas outlet configured to provide a second gas flow over the planar surface in use with a directional component parallel to the planar surface, the second gas outlet is further away from the planar surface than the first gas outlet and the second gas outlet is configured to provide the second gas flow at an incline to the planar surface,

wherein the first and second gas outlets are arranged to provide their respective gas flows to be in contact with the planar surface in use, and

wherein the first and second gas outlets are arranged such that separately controlled gas flows can be provided respectively to the first and second gas outlets.

16. The patterning apparatus of claim 15, comprising a further gas outlet than the first and second outlets, the further gas outlet configured to provide a further gas flow over the planar surface, the further gas outlet at a different distance perpendicular to the planar surface of the patterning device than the first and second gas outlets and the further gas outlet is configured to provide the further gas flow at an incline to the planar surface.

17. The patterning apparatus of claim 15, wherein the first gas outlet and/or second gas outlet comprise a plurality of openings, each configured to provide a separate sub-flow of the respective first and/or second gas flow, the openings extending along a same side of the patterning device in plan view.

18. The patterning apparatus of claim 15, wherein at least the first gas outlet and the second gas outlet are provided on a same side of the patterning device in plan view.

19. The patterning apparatus of claim 15, further comprising a third gas outlet configured to provide a further gas flow over the planar surface, wherein at least the first gas outlet and the second gas outlet are provided on a same side of the patterning device in plan view and the third gas outlet is arranged on another side of the patterning device in plan view, the third gas outlet configured to provide the further gas flow with a directional component in a substantially opposite direction to the directional component of the gas exiting the first gas outlet and/or the second gas outlet.

20. A lithographic apparatus configured to transfer a pattern onto a substrate using a patterning device, the lithographic apparatus comprising the patterning apparatus of claim 15.