Imprint apparatus, imprint method, and method for producing article
First Claim
1. An imprint apparatus which forms a pattern in shot region on a substrate by using a mold and an imprint material, comprising:
- a substrate holding unit which attracts and holds the substrate, attracting force of the substrate varies according to a position of the shot region on the substrate;
a generation unit which generates heating distribution data indicating distribution of a heat value to be applied to the shot region;
a heating unit which gives heat to the shot region to deform the shot region;
an obtaining unit which obtains first information defined based on a difference of shapes of the shot region and a pattern portion of the mold, and second information about a deformation amount of the shot region, the second information is set based on a position of the shot region on the substrate, the second information being obtained by trying deformation of the shot region by the heating unit while the substrate holding unit is-attracting a position corresponding to the shot region of the substrate; and
a patterning unit configured to form the pattern while the heating unit is deforming the shot region based on the heating distribution data generated by the generation unit, whereinthe generation unit generates the heating distribution data based on the first information and the second information which are obtained by the obtaining unit.
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Abstract
An imprint apparatus includes a substrate holding unit. A generation unit generates heating distribution data indicating distribution of a heat value to be applied to a region to be processed. A heating unit gives heat to the region to be processed to deform the region. An obtaining unit which obtains first information defined based on a difference of shapes of the region and a pattern portion of the mold, and second information about a deformation amount of the region. The second information is obtained, by trying deformation of the region to be processed by the heating unit while the substrate holding unit attracts the substrate. A patterning unit forms the pattern while the heating unit is deforming the region to be processed based on the heating distribution data generated, in which the generation unit generates the heating distribution data based on the obtained first and second information.
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Citations
17 Claims
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1. An imprint apparatus which forms a pattern in shot region on a substrate by using a mold and an imprint material, comprising:
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a substrate holding unit which attracts and holds the substrate, attracting force of the substrate varies according to a position of the shot region on the substrate; a generation unit which generates heating distribution data indicating distribution of a heat value to be applied to the shot region; a heating unit which gives heat to the shot region to deform the shot region; an obtaining unit which obtains first information defined based on a difference of shapes of the shot region and a pattern portion of the mold, and second information about a deformation amount of the shot region, the second information is set based on a position of the shot region on the substrate, the second information being obtained by trying deformation of the shot region by the heating unit while the substrate holding unit is-attracting a position corresponding to the shot region of the substrate; and a patterning unit configured to form the pattern while the heating unit is deforming the shot region based on the heating distribution data generated by the generation unit, wherein the generation unit generates the heating distribution data based on the first information and the second information which are obtained by the obtaining unit. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. An imprint apparatus which forms a pattern in shot region on a substrate by using a mold and an imprint material, comprising:
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a substrate holding unit which attracts and holds the substrate, attracting force of the substrate varies according to a position of the shot region on the substrate; a plurality of attracting units each of which is able to control an attracting force of the substrate for each of a plurality of divided regions included in the substrate holding unit; a generation unit which generates heating distribution data indicating distribution of a heat value to be applied to the region to be processed; a heating unit which gives heat to the region to be processed to deform the shot region; an obtaining unit which obtains first information defined based on a difference of shapes of the shot region and a pattern portion of the mold, and second information about a deformation amount of the shot region, the second information is set based on a position of the shot region on the substrate, the second information being obtained by trying deformation of the shot region by the heating unit while the substrate holding unit attracting a position corresponding to the shot region of the substrate; and a patterning unit configured to form the pattern while the heating unit is deforming the shot region based on the heating distribution data generated by the generation unit, wherein the obtaining unit obtains the second information corresponding to a plurality of different positions of the divided regions attracted by common attraction units, and the generation unit generates the heating distribution data corresponding to the plurality of different positions based on the first information and each of the second information which are obtained by the obtaining unit.
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14. An imprint apparatus which forms a pattern in shot region on a substrate by using a mold and an imprint material, comprising:
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a substrate holding unit which attracts and holds the substrate, attracting force of the substrate varies according to a position of the shot region on the substrate; and a heating unit which gives heat to the shot region to deform the shot region;
whereinthe heating unit deforms the shot region based on heating distribution data indicating distribution of a heat value to be applied to the shot region, that is generated based on first information defined based on a difference of shapes of the shot region and a pattern portion of the mold, and second information obtained by deforming the shot region with the heating unit while the substrate holding unit attracting a position corresponding to the shot region of the substrate, and the second information at a first shot region on the substrate is different from the second information at a second shot region that is different from the first shot region on the substrate. - View Dependent Claims (15)
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16. An imprint apparatus which forms a pattern in shot region on a substrate by using a mold and an imprint material, comprising:
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a heating unit which gives heat to the shot region to deform the shot region; and a substrate holding unit in which attracting force of the substrate varies according to a position of the shot region on the substrate, wherein the heating unit deforms the shot region based on first information regarding a difference of shapes of the shot region and a pattern portion of the mold, and second information regarding the position of the shot region on the substrate, and wherein the second information is set based on a position of the shot region on the substrate. - View Dependent Claims (17)
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Specification