Scanning exposure device, manufacturing method of scanning exposure device and control method of scanning exposure device

• US 10,642,185 B2
• Filed: 02/08/2019
• Issued: 05/05/2020
• Est. Priority Date: 02/08/2018
• Status: Active Grant

• Current Assignee: Brother Kogyo Kabushiki Kaisha
• Original Assignee: Brother Kogyo Kabushiki Kaisha
• Inventors: Shimadu, Michihiro, Hachiya, Shunsuke, Nakamura, Yoshifumi
• Primary Examiner(s): Giampaolo, II, Thomas S
• Application Number:
  US16/270,873
• Publication Number:
  US 20190243276A1
• Time in Patent Office: 452 Days
• CPC Class Codes: G03G 15/043 with means for controlling illumination or exposure G03G15/041 takes precedence

Abstract

A scanning exposure device including: a first and a second light sources emitting a first and second beam, respectively; a polygon mirror having reflecting surfaces; a first and a second optical sensors detecting the first and the second beam, respectively; and a controller storing first writing time until which an exposure by the first beam starts after the first beam is detected and second writing time until which an exposure by the second beam starts after the first beam is detected, for respective reference surface identifiers specifying the respective reflecting surfaces, and the controller acquires a first timing at which the first beam is detected and a second timing at which the second beam is detected for the respective reflecting surfaces identified by respective acquisition surface identifiers; and specifies a correspondence relation between the respective reference surface identifiers and the respective acquisition surface identifiers.

Claims

1. A scanning exposure device comprising:

a first light source configured to emit a first beam;

a second light source configured to emit a second beam;

a polygon mirror having N reflecting surfaces for reflecting the first beam and the second beam;

a first scanning optical system configured to focus the first beam, which is reflected by the polygon mirror, on a first image surface;

a second scanning optical system configured to focus the second beam, which is reflected by the polygon mirror, on a second image surface;

a first optical sensor configured to detect the first beam reflected by the polygon mirror;

a second optical sensor configured to detect the second beam reflected by the polygon mirror; and

a controller storing reference surface identifiers that respectively specify the reflecting surfaces of the polygon mirror and storing first writing time, which is a time until which the first image surface is started to be exposed by the first beam after the first beam is detected by the first optical sensor, and second writing time, which is a time until which the second image surface is started to be exposed by the second beam after the first beam is detected by the first optical sensor, for each of the reference surface identifiers,

wherein the controller is configured to;

acquire a first timing at which the first optical sensor detects the first beam and a second timing at which the second optical sensor detects the second beam for each of the reflecting surfaces when the polygon mirror is rotated at a constant speed and the first beam and the second beam are reflected by each of the reflecting surfaces, the respective reflecting surfaces being identified by respective acquisition surface identifiers; and

specify a correspondence relation between the respective reference surface identifiers and the respective acquisition surface identifiers based on the first timing and the second timing by selecting a correspondence pattern among N correspondence patterns from a first correspondence pattern to a N^th correspondence pattern, the first correspondence pattern being one correspondence pattern in which the respective reference surface identifiers and the respective acquisition surface identifiers are associated, and each of a second correspondence pattern to the N^th correspondence pattern of the N correspondence patterns being a correspondence pattern in which each of the reference surface identifiers or each of the acquisition surface identifiers is deviated from the one correspondence pattern by 1 to N−

1.

2. The scanning exposure device according to claim 1,

wherein the controller is configured to specify the correspondence relation between the respective reference surface identifiers and the respective acquisition surface identifiers based on a time difference between the first timing and the second timing.

3. The scanning exposure device according to claim 2,

wherein the first timing is a timing at which the first beam is detected and the second timing at which the second beam is detected, the first beam and the second beam being reflected by a reflecting surface of the polygon mirror specified by the same reference surface identifier.

4. The scanning exposure device according to claim 2

wherein the time difference between the first timing and the second timing is smaller than a time difference between a timing at which the first optical sensor detects the first beam reflected by a first reflecting surface of the polygon mirror and a timing at which the first optical sensor detects the first beam reflected by a second reflecting surface of the polygon mirror next to the first reflecting surface.

5. The scanning exposure device according to claim 1,

wherein when specifying the correspondence relation, the controller is configured to calculate:

a first correlation coefficient, which is the correlation coefficient in a case where the reference time difference stored for each of the reference surface identifiers and the time difference between the first timing and the second timing acquired for each of the acquisition surface identifiers are associated with each other in the one correspondence pattern; and

a second correlation coefficient to a N^th correlation coefficient, each of which is the correlation coefficient in a case where the correspondence relation between the respective reference surface identifiers and the respective acquisition surface identifiers is associated in a correspondence pattern in which each of the reference surface identifiers or each of the acquisition surface identifiers is deviated from the one correspondence pattern by 1 to N−

1, and

the controller is configured to specify the correspondence relation between the respective reference surface identifiers and the respective acquisition surface identifiers by selecting a correspondence pattern in which a correlation coefficient is closest to 1 of the first correlation coefficient to the N^th correlation coefficient.

6. The scanning exposure device according to claim 5,

wherein in a case where the first correlation coefficient to the N^th correlation coefficient are all smaller than 0.7 when specifying the correspondence relation, the controller sets the first writing time to be the same for all the reflecting surfaces and sets the second writing time to be the same for all the reflecting surfaces.

7. The scanning exposure device according to claim 1,

wherein the first scanning optical system and the second scanning optical system are disposed at opposite sides with the polygon mirror being interposed therebetween, as seen from a rotation axis direction of the polygon mirror.

8. The scanning exposure device according to claim 1, further comprising:

a third light source configured to emit a third beam, and

a third scanning optical system configured to focus the third beam, which is reflected by the polygon mirror, on a third image surface,

wherein the controller further stores third writing time, which is time until which the third image surface is started to be exposed by the third beam after the first beam is detected by the first optical sensor, for each of the reference surface identifiers.

9. The scanning exposure device according to claim 1,

wherein the first optical sensor is disposed at a more upstream side with respect to a scanning direction than a range in which the first beam is to be scanned so as to expose the first image surface, and

wherein the second optical sensor is disposed at a more downstream side with respect to the scanning direction than a range in which the second beam is to be scanned so as to expose the second image surface.

10. The scanning exposure device according to claim 1,

wherein the first light source has a plurality of light-emitting points and the second light source has a plurality of light-emitting points, and

wherein the controller stores the first writing time for each first beam emitted from the plurality of light-emitting points of the first light source and the second writing time for each second beam emitted from the plurality of light-emitting points of the second light source.

11. A control method of a scanning exposure device, the scanning exposure device comprising:

a first light source configured to emit a first beam;

a second light source configured to emit a second beam;

a polygon mirror having N reflecting surfaces for reflecting the first beam and the second beam;

a first scanning optical system configured to focus the first beam, which is reflected by the polygon mirror, on a first image surface;

a second scanning optical system configured to focus the second beam, which is reflected by the polygon mirror, on a second image surface;

a first optical sensor configured to detect the first beam reflected by the polygon mirror;

a second optical sensor configured to detect the second beam reflected by the polygon mirror; and

a storage in which reference surface identifiers that respectively specify the reflecting surfaces of the polygon mirror are stored, and in which first writing time, which is time until which the first image surface is started to be exposed by the first beam after the first beam is detected by the first optical sensor, and second writing time, which is time until which the second image surface is started to be exposed by the second beam after the first beam is detected by the first optical sensor, are stored for each of the reference surface identifiers,

wherein the control method comprises;

acquiring a first timing, at which the first optical sensor detects the first beam, and a second timing, at which the second optical sensor detects the second beam, when the polygon mirror is rotated at a constant speed and the first beam and the second beam are reflected by each of the reflecting surfaces of the polygon mirror, the respective reflecting surfaces being identified by respective acquisition surface identifiers; and

specifying a correspondence relation between the respective reference surface identifiers and the respective acquisition surface identifiers based on the first timing and the second timing by selecting a correspondence pattern among N correspondence patterns from a first correspondence pattern to a N^th correspondence pattern, the first correspondence pattern being one correspondence pattern in which the respective reference surface identifiers and the respective acquisition surface identifiers are associated, and each of a second correspondence pattern to the N^th correspondence pattern of the N correspondence patterns being a correspondence pattern in which each of the reference surface identifiers or each of the acquisition surface identifiers is deviated from the one correspondence pattern by 1 to N−

1.

12. A scanning exposure device comprising:

a first light source configured to emit a first beam;

a second light source configured to emit a second beam;

a polygon mirror having N reflecting surfaces for reflecting the first beam and the second beam;

a first scanning optical system configured to focus the first beam, which is reflected by the polygon mirror, on a first image surface;

a second scanning optical system configured to focus the second beam, which is reflected by the polygon mirror, on a second image surface;

a first optical sensor configured to detect the first beam reflected by the polygon mirror;

a second optical sensor configured to detect the second beam reflected by the polygon mirror; and

a controller having a storage storing;

reference surface identifiers that respectively specify the reflecting surfaces of the polygon mirror;

first writing time, which is time until which the first image surface is started to be exposed by the first beam after the first beam is detected by the first optical sensor, for each of the reference surface identifiers;

second writing time, which is time until which the second image surface is started to be exposed by the second beam after the first beam is detected by the first optical sensor, for each of the reference surface identifiers; and

a reference time difference between a timing at which the first optical sensor detects the first beam and a timing at which the second optical sensor detects the second beam for each of the reference surface identifiers,

wherein the first writing time, the second writing time, and the reference time difference are stored in the storage for each of the reference surface identifiers during manufacturing of the scanning exposure device, and

wherein the controller is configured to;

acquire an acquisition time difference between a first timing at which the first optical sensor detects the first beam and a second timing at which the second optical sensor detects the second beam for each of the reflecting surfaces when the polygon mirror is rotated at a constant speed and the first beam and the second beam are reflected by each of the reflecting surfaces, the respective reflecting surfaces being identified by respective acquisition surface identifiers; and

specify a correspondence relation between the respective reference surface identifiers and the respective acquisition surface identifiers based on a comparison between the reference time difference and the acquisition time difference.

13. A scanning exposure device according to claim 12,

wherein the controller is configured to specify the correspondence relation between the respective reference surface identifiers and the respective acquisition surface identifiers based on the comparison between the reference time difference and the acquisition time difference by selecting a correspondence pattern among N correspondence patterns from a first correspondence pattern to a N^th correspondence pattern, the first correspondence pattern being one correspondence pattern in which the respective reference surface identifiers and the respective acquisition surface identifiers are associated, and each of a second correspondence pattern to the N^th correspondence pattern of the N correspondence patterns being a correspondence pattern in which each of the reference surface identifiers or each of the acquisition surface identifiers is deviated from the one correspondence pattern by 1 to N−

1.