Plasma generating apparatus, plasma processing apparatus, and method of controlling plasma generating apparatus
First Claim
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1. A plasma generating apparatus comprising:
- a high frequency power supply that generates a high frequency power;
a plasma generation electrode connected to the high frequency power supply and formed by a hollow tube in which cooling water is distributed;
a conductivity meter that measures conductivity of the cooling water inside the plasma generation electrode; and
a controller that controls output of the high frequency power supply based on the conductivity of the cooling water measured by the conductivity meter such that a state of plasma generated by the plasma generation electrode is maintained while the conductivity of the cooling water inside the plasma generation electrode varies.
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Abstract
A plasma generating apparatus according to the present disclosure includes: a high frequency power supply that generates a high frequency power; a plasma generation electrode connected to the high frequency power supply and formed by a hollow tube in which cooling water is distributed; a conductivity meter that measures conductivity of the cooling water inside the plasma generation electrode; and a controller that controls output of the high frequency power supply based on the conductivity of the cooling water measured by the conductivity meter.
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9 Claims
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1. A plasma generating apparatus comprising:
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a high frequency power supply that generates a high frequency power; a plasma generation electrode connected to the high frequency power supply and formed by a hollow tube in which cooling water is distributed; a conductivity meter that measures conductivity of the cooling water inside the plasma generation electrode; and a controller that controls output of the high frequency power supply based on the conductivity of the cooling water measured by the conductivity meter such that a state of plasma generated by the plasma generation electrode is maintained while the conductivity of the cooling water inside the plasma generation electrode varies. - View Dependent Claims (2, 3, 4, 5, 6, 8)
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7. A plasma processing apparatus comprising:
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a processing chamber; a placing table provided inside the processing chamber and configured to place a substrate on an upper surface thereof; a processing gas supply nozzle provided above the placing table and configured to supply a processing gas to the upper surface of the placing table; and a plasma generating apparatus that activates the processing gas supplied by the processing gas supply nozzle, wherein the plasma generating apparatus includes; a high frequency power supply that generates a high frequency power; a plasma generation electrode connected to the high frequency power supply and formed by a hollow tube in which cooling water is distributed; a conductivity meter that measures conductivity of the cooling water inside the plasma generation electrode; and a controller that controls output of the high frequency power supply based on the conductivity of the cooling water measured by the conductivity meter such that a state of plasma generated by the plasma generation electrode is maintained while the conductivity of the cooling water inside the plasma generation electrode varies. - View Dependent Claims (9)
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Specification