Method for operation instability detection in a surface wave plasma source
First Claim
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1. A system for plasma processing comprising:
- a surface wave plasma source configured to generate a plasma field;
wherein the surface wave plasma source further comprises a plasma distribution plate having a plurality of regions of non-uniformity on a surface of the plasma distribution plate, wherein the plurality of regions of non-uniformity comprise dimples formed on the surface of the plasma distribution plate;
a plurality of optical sensors configured to generate information characteristic of optical energy collected by way of a plurality of optical fibers each disposed on an interior surface of a respective one of the dimples; and
a sensor logic unit configured to detect a region of instability in response to the information generated by the plurality of optical sensors,wherein the sensor logic unit comprises a comparator, and wherein the sensor logic unit generates an instability signal in response to a determination that;
(i) a difference between a sensor signal of one of the optical sensors and a reference signal exceeds a threshold value, or(ii) a difference between one sensor signal of one of the optical sensors and another sensor signal of another of the optical sensors exceeds a threshold value.
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Abstract
Provided are methods and systems for operation instability detection in a surface wave plasma source. In an embodiment a system for plasma processing may include a surface wave plasma source configured to generate a plasma field. The system may also include an optical sensor configured to generate information characteristic of optical energy collected in a region proximate to the surface wave plasma source. Additionally, the system may include a sensor logic unit configured to detect a region of instability proximate to the surface wave plasma source in response to the information generated by the optical sensor.
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Citations
16 Claims
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1. A system for plasma processing comprising:
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a surface wave plasma source configured to generate a plasma field; wherein the surface wave plasma source further comprises a plasma distribution plate having a plurality of regions of non-uniformity on a surface of the plasma distribution plate, wherein the plurality of regions of non-uniformity comprise dimples formed on the surface of the plasma distribution plate; a plurality of optical sensors configured to generate information characteristic of optical energy collected by way of a plurality of optical fibers each disposed on an interior surface of a respective one of the dimples; and a sensor logic unit configured to detect a region of instability in response to the information generated by the plurality of optical sensors, wherein the sensor logic unit comprises a comparator, and wherein the sensor logic unit generates an instability signal in response to a determination that; (i) a difference between a sensor signal of one of the optical sensors and a reference signal exceeds a threshold value, or (ii) a difference between one sensor signal of one of the optical sensors and another sensor signal of another of the optical sensors exceeds a threshold value. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A system for plasma processing comprising:
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a surface wave plasma source configured to generate a plasma field; at least one optical sensor configured to generate information characteristic of optical energy collected in a region proximate to the surface wave plasma source; a sensor logic unit configured to detect a region of instability proximate to the surface wave plasma source in response to the information generated by the at least one optical sensor; wherein the surface wave plasma source further comprises a plasma distribution plate having a plurality of regions of non-uniformity on a surface of the plasma distribution plate; wherein the plurality of regions of non-uniformity comprise dimples formed on the surface of the plasma distribution plate; and the system further comprising plural optical fibers coupled to the plasma distribution plate and disposed in regions proximate different ones of the dimples formed on the surface of the plasma distribution plate, and the optical fibers are configured to collect the optical energy from plasma generated in the regions proximate to the dimples formed on the surface of the plasma distribution plate, wherein a first end of each of the optical fibers is disposed on an interior surface of a respective one of the dimples. - View Dependent Claims (10, 11, 12, 13)
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14. A method for plasma processing comprising:
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generating a plasma field with a surface wave plasma source; generating information characteristic of optical energy collected in a region proximate to the surface wave plasma source with at least one optical sensor; detecting, with a sensor logic unit, a region of instability proximate to the surface wave plasma source in response to the information generated by the at least one optical sensor; wherein the generating information includes collecting information pertaining to optical energy at plural different regions proximate to the surface wave plasma source and providing the information from the plural different regions to the at least one optical sensor, and the at least one optical sensor generates sensor signals corresponding to the information collected at the plural different regions proximate to the surface wave plasma source; wherein the surface wave plasma source includes a plasma distribution plate having plural regions of non-uniformity, wherein the plurality of regions of non-uniformity comprise dimples formed on the surface of the plasma distribution plate, and the collecting information at plural different regions includes collecting information by way of a plurality of optical fibers each disposed on an interior surface of a respective one of the dimples; and the method further including generating an instability signal in response to a determination of at least one of; (i) a difference between a sensor signal and a reference signal exceeds a threshold value, or (ii) a difference between a sensor signal corresponding to one region of the plural regions of non-uniformity and another sensor signal corresponding to another region of the plural regions of non-uniformity exceeds a threshold value. - View Dependent Claims (15, 16)
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Specification