Photoresist baking apparatus

• US 10,656,525 B2
• Filed: 07/02/2018
• Issued: 05/19/2020
• Est. Priority Date: 09/01/2017
• Status: Expired due to Fees

• Current Assignee: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. (TCL Technology Group Corp.)
• Original Assignee: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. (TCL Technology Group Corp.)
• Inventors: Chen, Chung-jen, Lin, Ming-wen, Li, Yan-ze, Wu, Chilin, Wu, Zhikun
• Primary Examiner(s): Gravini, Stephen M
• Application Number:
  US16/025,235
• Publication Number:
  US 20190072852A1
• Time in Patent Office: 687 Days
• Field of Search: 34231
• CPC Class Codes: B05D 3/0272 with ovens
• CPC Class Codes: B05D 3/0413 Heating with air
• CPC Class Codes: B05D 3/0473 for heating, e.g. vapour heating
• CPC Class Codes: G03F 7/168 Finishing the coated layer, e.g. drying, baking, soaking

Abstract

A photoresist baking apparatus is provided. The photoresist baking apparatus comprises a baking chamber including an inlet, an outlet and a cover sealed connected thereon. The cover is applied to guide the hot air entering the baking chamber and includes a heating device for maintaining the temperature of the hot air. The heating device is disposed on the cover for heating the hot air flowing to the cover and maintaining the temperature of the hot air to be consistent when the hot air flowing to the outlet, thereby to prevent from the photoresist volatile condensing and dripping due to decreased temperature after the photoresist volatile contacting the cover and affecting the product quality, and to guarantee the temperature homogeneity inside the baking chamber.

Claims

1. A photoresist baking apparatus comprising:

a baking chamber, including an inlet, an outlet and a cover sealed connected thereon, wherein the cover is applied to guide a hot air entering the baking chamber and includes a heating device disposed thereon for maintaining a temperature of the hot air,

wherein the inlet and the outlet are disposed separately on two opposite sides of the baking chamber,

wherein the baking chamber includes a first diversion channel disposed on the inlet inside the baking chamber for guiding the hot air flowing to the cover, wherein the first diversion channel includes an import sealed connected to the inlet and an export facing the cover, and

wherein the baking chamber includes a second diversion channel disposed on the outlet inside the baking chamber for recycling the hot air, wherein the second diversion channel includes an import facing the cover and an export sealed connected to the outlet.

2. The photoresist baking apparatus according to claim 1, wherein the heating device is a resistance coil disposed on the cover.

3. The photoresist baking apparatus according to claim 1, wherein the heating device is a positive temperature coefficient (PTC) heating plate.

4. The photoresist baking apparatus according to claim 1, wherein the heating device is disposed on one side of the cover close to the outlet.

5. The photoresist baking apparatus according to claim 4, wherein the heating device is disposed on one surface of the cover away from the baking chamber.

6. The photoresist baking apparatus according to claim 1, further comprising an exhausting device connected to the outlet through a pipe.

7. The photoresist baking apparatus according to claim 6, further comprising a hot air generating device connected to the inlet through a pipe.