Synaptic crossbar memory array
First Claim
1. A method of forming an Integrated Circuit (IC) chip, said method comprising:
- forming a plurality of transistors on a surface of a semiconductor wafer;
forming a connective layer above said plurality of transistors;
forming a bottom electrode layer on said connective layer, said bottom electrode layer including one or more bottom electrode lines of a first metal and connected to ones said plurality of transistors through said connective layer;
forming a one or more amorphous semiconductor synapses on said one or more bottom electrode lines;
forming an upper electrode layer above said one or more amorphous semiconductor synapses, said upper electrode layer including one or more upper electrode lines of a second metal oriented orthogonally to said one or more bottom electrode lines and connected to others of said plurality of transistors, each amorphous semiconductor synapse being between a bottom electrode line and an upper electrode line, said second metal being different than the first and one of said first metal and said second metal being a refractory metal; and
completing chip fabrication.
1 Assignment
0 Petitions
Accused Products
Abstract
A method of forming an Integrated Circuit (IC) chip, the IC chip and an on-chip synaptic crossbar memory array. Chip devices are formed on a surface of a semiconductor wafer. A connective layer is formed above the chip devices. A bottom electrode layer is formed on the connective layer. A neuromorphic synapse layer is formed above the bottom electrode layer with each synapse on a bottom electrode. Upper electrodes are formed above the synapses and orthogonal to bottom electrode lines. Each synapse being beneath an upper electrode where the upper electrode crosses a bottom electrode. Upper electrodes are refractory metal and the bottom electrodes are copper, or vice versa.
15 Citations
20 Claims
-
1. A method of forming an Integrated Circuit (IC) chip, said method comprising:
-
forming a plurality of transistors on a surface of a semiconductor wafer; forming a connective layer above said plurality of transistors; forming a bottom electrode layer on said connective layer, said bottom electrode layer including one or more bottom electrode lines of a first metal and connected to ones said plurality of transistors through said connective layer; forming a one or more amorphous semiconductor synapses on said one or more bottom electrode lines; forming an upper electrode layer above said one or more amorphous semiconductor synapses, said upper electrode layer including one or more upper electrode lines of a second metal oriented orthogonally to said one or more bottom electrode lines and connected to others of said plurality of transistors, each amorphous semiconductor synapse being between a bottom electrode line and an upper electrode line, said second metal being different than the first and one of said first metal and said second metal being a refractory metal; and completing chip fabrication. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
-
-
10. An alterable synapse array comprising:
-
a plurality of transistors on a device layer; a connective layer on said device layer, interlevel vias in said connective layer connecting to selected transistors; one or more bottom electrode lines of a first metal on said connective layer, each bottom electrode line connecting to at least one interlevel via; one or more amorphous semiconductor synapses, each synapse being on one of said one or more bottom electrode lines; and an upper electrode layer above said one or more amorphous semiconductor synapses, said upper electrode layer including one or more upper electrode lines of a second metal oriented orthogonally to said one or more bottom electrode lines and connected to others of said plurality of transistors, each amorphous semiconductor synapse being between a respective bottom electrode line and an upper electrode line, said second metal being different than the first and one of said first metal and said second metal being a refractory metal. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17)
-
-
18. An Integrated Circuit (IC) chip comprising:
-
a plurality of transistors on a device layer; a connective layer on said device layer, interlevel vias in said connective layer connecting to selected transistors; an alterable synapse array comprising; a bottom electrode layer on said connective layer, said bottom electrode layer including one or more bottom electrode lines of a first metal oriented in a first direction, each bottom electrode line connecting to at least one interlevel via, one or more amorphous semiconductor ridges, each being on, and coextensive with, one of said one or more bottom electrode lines, one or more amorphous semiconductor synapses, each synapse being on one of said one or more bottom electrode lines, and an upper electrode layer above said one or more amorphous semiconductor ridges, said upper electrode layer including one or more upper electrode lines of a second metal oriented orthogonally to said one or more bottom electrode lines and connected to others of said plurality of transistors, amorphous semiconductor synapses being formed in said ridges between bottom electrode lines and upper electrode lines; and a plurality of wiring layers connecting said plurality of transistors into IC chip circuits. - View Dependent Claims (19, 20)
-
Specification