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Field-biased second harmonic generation metrology

  • US 10,663,504 B2
  • Filed: 10/31/2017
  • Issued: 05/26/2020
  • Est. Priority Date: 04/17/2014
  • Status: Active Grant
First Claim
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1. A system for optically interrogating a surface of a sample while applying a bias to said sample, said system comprising:

  • a first optical source configured to emit probing radiation, said first optical source disposed so as to direct said probing radiation onto said surface of said sample;

    a first contact electrical probe configured to form electrical contact with said sample;

    a second capacitively coupled probe configured to capacitively couple with said sample without touching said surface of said sample;

    a power supply configured to apply said bias to said sample via said first contact electrical probe and said second capacitively coupled probe;

    an optical detector configured to detect second harmonic generated light from the sample; and

    processing electronics configured to determine a characteristic of the detected second harmonic generated light.

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