Nanoparticle with plural functionalities, and method of forming the nanoparticle
First Claim
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1. A nanoparticle comprising:
- a cuboid base comprising a semiconductor material; and
a plurality of surfaces formed on the cuboid base and including a plurality of functionalities, respectively, the plurality of surfaces comprising;
a first surface including a first layer formed on a first side of the cuboid base; and
a second surface including a second layer different than the first layer, the second layer being formed on a second side of the cuboid base and on a side of the first layer.
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Abstract
A nanoparticle includes a cuboid base including a semiconductor material, and a plurality of surfaces formed on the base and including a plurality of functionalities, respectively.
51 Citations
19 Claims
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1. A nanoparticle comprising:
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a cuboid base comprising a semiconductor material; and a plurality of surfaces formed on the cuboid base and including a plurality of functionalities, respectively, the plurality of surfaces comprising; a first surface including a first layer formed on a first side of the cuboid base; and a second surface including a second layer different than the first layer, the second layer being formed on a second side of the cuboid base and on a side of the first layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A nanoparticle comprising:
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a cuboid base comprising a semiconductor material; a first layer having a first functionality and formed on a first side of the cuboid base; and a second layer having a second functionality different than the first functionality and formed on a second side of the cuboid base and on a side of the first layer. - View Dependent Claims (15, 16, 17, 18)
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19. A nanoparticle comprising:
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a cuboid base comprising a semiconductor material; a first surface comprising a first layer having a first functionality and formed on a first side of the cuboid base; a second surface comprising a second layer having a second functionality different from the first functionality and formed on a second side of the cuboid base and on a side of the first layer; a third surface comprising the semiconductor material; a fourth surface formed opposite the second surface and including the second layer; a fifth surface formed opposite the third surface and including the semiconductor material; and a sixth surface formed opposite the first surface and including the semiconductor material.
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Specification