Showerhead assembly with multiple fluid delivery zones
First Claim
1. A showerhead assembly, comprising:
- an underplate;
a diffuser plate disposed adjacent the underplate, wherein a first plenum is defined between the underplate and the diffuser plate;
a movable conductance controller assembly extending through the underplate into the first plenum, the movable conductance controller assembly configured to control the conductance of a first gas within the first plenum, wherein the movable conductance controller assembly comprises a conductance controller and an actuator; and
a faceplate having a first side and a second side, the first side of the faceplate being disposed adjacent to the diffuser plate, wherein a second plenum is defined between the diffuser plate and the first side of the faceplate.
1 Assignment
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Accused Products
Abstract
The present disclosure relates to a semiconductor processing apparatus. The processing chamber includes a chamber body and lid defining an interior volume, a substrate support disposed in the interior volume and a showerhead assembly disposed between the lid and the substrate support. The showerhead assembly includes a faceplate configured to deliver a process gas to a processing region defined between the showerhead assembly and the substrate support and an underplate positioned above the faceplate, defining a first plenum between the lid and the underplate, the having multiple zones, wherein each zone has a plurality of openings that are configured to pass an amount of inert gas from the first plenum into a second plenum defined between the faceplate and the underplate, in fluid communication with the plurality of openings of each zone such that the inert gas mixes with the process gas before exiting the showerhead assembly.
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Citations
20 Claims
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1. A showerhead assembly, comprising:
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an underplate; a diffuser plate disposed adjacent the underplate, wherein a first plenum is defined between the underplate and the diffuser plate; a movable conductance controller assembly extending through the underplate into the first plenum, the movable conductance controller assembly configured to control the conductance of a first gas within the first plenum, wherein the movable conductance controller assembly comprises a conductance controller and an actuator; and a faceplate having a first side and a second side, the first side of the faceplate being disposed adjacent to the diffuser plate, wherein a second plenum is defined between the diffuser plate and the first side of the faceplate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A processing chamber, comprising:
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a chamber body; a substrate support assembly disposed within the chamber body; and a shower head assembly disposed above the substrate support assembly within the chamber body, wherein the showerhead assembly comprises; an underplate; a diffuser plate disposed adjacent the underplate, wherein a first plenum is defined between the underplate and the diffuser plate; a movable conductance controller assembly extending through the underplate into the first plenum, the movable conductance controller assembly configured to control the conductance of a first gas within the first plenum, wherein the movable conductance controller assembly comprises a conductance controller and an actuator; and a faceplate having a first side and a second side, the first side of the faceplate being disposed adjacent to the diffuser plate, wherein a second plenum is defined between the diffuser plate and the first side of the faceplate. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification