Systems and methods for pedestal configuration
First Claim
1. An apparatus, comprising:
- an annular mounting block having a central axis, a sidewall about the central axis, and a mounting platform extending radially inward from the sidewall toward the central axis;
a plurality of first gauges mounted on the mounting platform such that the plurality of first gauges are oriented substantially parallel to the central axis, the plurality of first gauges configured to obtain a first plurality of measurements indicative of relative distances between a plane that is substantially perpendicular to the central axis of the annular mounting block and measured points; and
a plurality of second gauges mounted on the mounting platform such that the plurality of second gauges are oriented substantially perpendicular to the central axis and a measuring tip of each second gauge of the plurality of second gauges extends radially beyond the sidewall of the annular mounting block, the plurality of second gauges configured to obtain a second plurality of measurements indicative of relative distances between the central axis of the annular mounting block and measured points.
1 Assignment
0 Petitions
Accused Products
Abstract
Exemplary apparatuses for centering and/or leveling a pedestal of a processing chamber may include a mounting block having a central axis, a set of first gauges mounted on the mounting block, and a set of second gauges mounted on the mounting block. The set of second gauges may be mounted substantially perpendicular to the set of first gauges. The plurality of first gauges may be configured to obtain measurements indicative of a degree of parallelism between a gas distribution plate of the processing chamber and the pedestal. The plurality of second gauges may be configured to obtain measurements indicative of a degree of axial alignment of a ring member of the processing chamber and the pedestal. The exemplary apparatuses may be used for centering and/or leveling the pedestal under vacuum.
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Citations
20 Claims
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1. An apparatus, comprising:
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an annular mounting block having a central axis, a sidewall about the central axis, and a mounting platform extending radially inward from the sidewall toward the central axis; a plurality of first gauges mounted on the mounting platform such that the plurality of first gauges are oriented substantially parallel to the central axis, the plurality of first gauges configured to obtain a first plurality of measurements indicative of relative distances between a plane that is substantially perpendicular to the central axis of the annular mounting block and measured points; and a plurality of second gauges mounted on the mounting platform such that the plurality of second gauges are oriented substantially perpendicular to the central axis and a measuring tip of each second gauge of the plurality of second gauges extends radially beyond the sidewall of the annular mounting block, the plurality of second gauges configured to obtain a second plurality of measurements indicative of relative distances between the central axis of the annular mounting block and measured points. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method comprising:
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collecting, via a plurality of first dial gauges, a first set of measurements indicative of relative distances between a plurality of locations at a gas distribution member of a semiconductor processing chamber and a top surface of a pedestal of the semiconductor processing chamber; and adjusting the pedestal to a first position based on the first set of measurements such that the top surface of the pedestal is substantially parallel to a bottom surface of the gas distribution member. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. An apparatus comprising:
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a gauge mounting block; a plurality of first gauges mounted on the gauge mounting block, the plurality of first gauges configured to obtain measurements indicative of a degree of parallelism between a first component of a lid stack of a semiconductor processing chamber and a pedestal of the semiconductor processing chamber; and a plurality of second gauges mounted on the gauge mounting block, the plurality of second gauges configured to obtain measurements indicative of a degree of axial alignment between a second component of the lid stack and the pedestal. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification