Systems and methods for pedestal configuration

• US 10,672,642 B2
• Filed: 07/30/2018
• Issued: 06/02/2020
• Est. Priority Date: 07/24/2018
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Bhat, Paneendra Prakash, Samir, Mehmet, Kalnin, Nikolai
• Primary Examiner(s): Guadalupe-McCall, Yaritza
• Application Number:
  US16/049,037
• Publication Number:
  US 20200035540A1
• Time in Patent Office: 673 Days
• Field of Search: 33301
• CPC Class Codes: G01C 9/02 Details
• CPC Class Codes: H01J 2237/20235 Z movement or adjustment
• CPC Class Codes: H01J 2237/20292 Means for position and/or orientation registration
• CPC Class Codes: H01J 37/32724 Temperature
• CPC Class Codes: H01L 21/67069 for drying etching
• CPC Class Codes: H01L 21/6719 characterized by the construction of the processing chambers, e.g. modular processing chambers
• CPC Class Codes: H01L 21/67259 Position monitoring, e.g. misposition detection or presence detection
• CPC Class Codes: H01L 21/68 for positioning, orientation or alignment
• CPC Class Codes: H01L 21/68742 characterised by a lifting arrangement, e.g. lift pins
• CPC Class Codes: H01L 21/68785 characterised by the mechanical construction of the susceptor, stage or support

Abstract

Exemplary apparatuses for centering and/or leveling a pedestal of a processing chamber may include a mounting block having a central axis, a set of first gauges mounted on the mounting block, and a set of second gauges mounted on the mounting block. The set of second gauges may be mounted substantially perpendicular to the set of first gauges. The plurality of first gauges may be configured to obtain measurements indicative of a degree of parallelism between a gas distribution plate of the processing chamber and the pedestal. The plurality of second gauges may be configured to obtain measurements indicative of a degree of axial alignment of a ring member of the processing chamber and the pedestal. The exemplary apparatuses may be used for centering and/or leveling the pedestal under vacuum.

Claims

1. An apparatus, comprising:

an annular mounting block having a central axis, a sidewall about the central axis, and a mounting platform extending radially inward from the sidewall toward the central axis;

a plurality of first gauges mounted on the mounting platform such that the plurality of first gauges are oriented substantially parallel to the central axis, the plurality of first gauges configured to obtain a first plurality of measurements indicative of relative distances between a plane that is substantially perpendicular to the central axis of the annular mounting block and measured points; and

a plurality of second gauges mounted on the mounting platform such that the plurality of second gauges are oriented substantially perpendicular to the central axis and a measuring tip of each second gauge of the plurality of second gauges extends radially beyond the sidewall of the annular mounting block, the plurality of second gauges configured to obtain a second plurality of measurements indicative of relative distances between the central axis of the annular mounting block and measured points.

2. The apparatus of claim 1, wherein the plurality of first gauges comprise at least three dial gauges, and wherein the plurality of second gauges comprise at least three dial gauges.

3. The apparatus of claim 1, wherein a measuring tip of each first gauge of the plurality of first gauges comprises a flat tip, and wherein the measuring tip of each second gauge of the plurality of second gauges comprises a roller tip.

4. The apparatus of claim 1, wherein the sidewall of the annular mounting block is characterized by a plurality of reference surfaces, wherein each reference surface of the plurality of reference surfaces is substantially parallel to the central axis of the annular mounting block and positioned at an equal distance from the central axis of the annular mounting block, and wherein each second gauge of the plurality of second gauges is mounted above one reference surface of the plurality of reference surfaces such that the measuring tip of each second gauge of the plurality of second gauges extends radially beyond the reference surface of the plurality of reference surfaces below.

5. The apparatus of claim 1, further comprising a reference plate having a raised portion characterized by a flat surface, wherein the reference plate is releasably attached to the mounting platform of the annular mounting block, wherein the annular mounting block defines a recess such that, when the reference plate is attached to the annular mounting block, the raised portion of the reference plate is received within the recess of the annular mounting block, and the flat surface faces a floor of the recess and is suspended from the floor of the recess.

6. The apparatus of claim 1, further comprising a gauge spindle compressor positionable about the central axis of the annular mounting block and defining a tapered inner surface, wherein the tapered inner surface is configured to compress a gauge spindle of each second gauge of the plurality of second gauges when the gauge spindle compressor is positioned about the central axis of the annular mounting block and the annular mounting block translates along the central axis of the annular mounting block.

7. The apparatus of claim 1, further comprising:

a leveling reference plate characterized by;

a first surface;

a second surface opposite to the first surface; and

a plurality of openings;

a zero setter comprising;

a cylindrical body having a plurality of protrusions extending from a first surface of the cylindrical body, wherein each protrusion of the plurality of protrusions of the zero setter is configured to be received in an opening of the plurality of openings of the leveling reference plate, and wherein each protrusion of the plurality of protrusions is characterized by a height dimension less than a thickness dimension of the leveling reference plate defined by the first surface and the second surface of the leveling reference plate such that the plurality of protrusions do not extend beyond the second surface of the leveling reference plate when the plurality of protrusions of the zero setter are received in the plurality of openings of the leveling reference plate; and

a plate member supported by the cylindrical body, wherein when the plurality of protrusions of the zero setter are received in the plurality of openings of the leveling reference plate, the zero setter is supported by the leveling reference plate such that a first surface of the plate member of the zero setter is parallel to the first surface of the leveling reference plate.

8. A method comprising:

collecting, via a plurality of first dial gauges, a first set of measurements indicative of relative distances between a plurality of locations at a gas distribution member of a semiconductor processing chamber and a top surface of a pedestal of the semiconductor processing chamber; and

adjusting the pedestal to a first position based on the first set of measurements such that the top surface of the pedestal is substantially parallel to a bottom surface of the gas distribution member.

9. The method of claim 8, further comprising:

reducing a pressure inside the semiconductor processing chamber toward vacuum prior to collecting the first set of measurements.

10. The method of claim 8, further comprising:

raising the pedestal to position a flat tip of a gauge spindle of each first dial gauge of the plurality of first dial gauges in contact with the bottom surface of the gas distribution member.

11. The method of claim 8, further comprising:

zeroing the plurality of first dial gauges with respect to the top surface of the pedestal.

12. The method of claim 8, further comprising:

collecting, via a plurality of second dial gauges, a second set of measurements indicative of relative distances between a plurality of locations at a ring member of the semiconductor processing chamber and a central axis of the pedestal; and

adjusting the pedestal to a second position based on the second set of measurements such that the central axis of the pedestal and a central axis of the ring member are aligned.

13. The method of claim 12, further comprising:

placing a gauge spindle compressor inside a chamber body of the semiconductor processing chamber, wherein the gauge spindle compressor comprises a tapered inner surface; and

raising the pedestal to cause a roller tip of a gauge spindle of each second dial gauge of the plurality of second dial gauges to slide along the tapered inner surface and pass the tapered inner surface until the roller tip of the gauge spindle of each second dial gauge of the plurality of second dial gauges is positioned against an inner surface of the ring member of the semiconductor processing chamber.

14. The method of claim 12, wherein the plurality of first dial gauges and the plurality of second dial gauges are mounted on a mounting block, the method further comprising:

placing the mounting block around the pedestal, wherein the mounting block comprises a plurality of protrusions to be received inside a plurality of recesses at the pedestal such that, when the mounting block is placed around the pedestal, a central axis of the mounting block and the central axis of the pedestal are aligned.

15. An apparatus comprising:

a gauge mounting block;

a plurality of first gauges mounted on the gauge mounting block, the plurality of first gauges configured to obtain measurements indicative of a degree of parallelism between a first component of a lid stack of a semiconductor processing chamber and a pedestal of the semiconductor processing chamber; and

a plurality of second gauges mounted on the gauge mounting block, the plurality of second gauges configured to obtain measurements indicative of a degree of axial alignment between a second component of the lid stack and the pedestal.

16. The apparatus of claim 15, wherein the semiconductor processing chamber further comprises a chamber body, wherein the lid stack is configured to be opened and closed relative to the chamber body such that a pressure inside the semiconductor processing chamber can be reduced toward vacuum when the lid stack is closed, wherein the plurality of first gauges are configured to obtain the measurements indicative of the degree of parallelism between the first component of the lid stack and the pedestal under vacuum, and wherein the plurality of second gauges are configured to obtain the measurements indicative of the degree of axial alignment between the second component of the lid stack and the pedestal under vacuum.

17. The apparatus of claim 15, wherein the gauge mounting block include a central axis, a sidewall about the central axis, and a mounting platform extending radially inward from the sidewall toward the central axis, wherein the plurality of first gauges and the plurality of second gauges are mounted on the mounting platform, and wherein the plurality of second gauges are oriented substantially perpendicular to the plurality of first gauges.

18. The apparatus of claim 15, further comprising a gauge spindle compressor configured to be positioned about a central axis of the pedestal, wherein the gauge spindle compressor comprises a tapered inner surface configured to engage and compress a roller tip of each second gauge of the plurality of second gauges.

19. The apparatus of claim 15, wherein the first component of the lid stack comprises a plate member, and wherein the degree of parallelism is determined between a lower surface of the plate member and an upper surface of the pedestal.

20. The apparatus of claim 15, wherein the second component of the lid stack comprises a ring member.