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Semiconductor device structures including stair step structures, and related semiconductor devices

  • US 10,672,657 B2
  • Filed: 02/27/2018
  • Issued: 06/02/2020
  • Est. Priority Date: 08/27/2015
  • Status: Active Grant
First Claim
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1. A semiconductor device structure, comprising:

  • a stair step structure comprising steps at least partially defined by laterally peripheral portions of partially conductive tiers overlying a substrate, the steps comprising;

    a lower step;

    an upper step; and

    a middle step longitudinally between the lower step and the upper step, the middle step having a greater width than a width of the lower step and a width of the upper step; and

    non-uniformly spaced contact structures over and in contact with the steps.

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