Light-emitting device and method for manufacturing the same
First Claim
1. A light emitting device comprising:
- a substrate;
a transistor comprising;
a first conductive layer over the substrate;
a first oxide insulating layer over the first conductive layer;
an oxide semiconductor layer over the first oxide insulating layer;
a second oxide insulating layer over the oxide semiconductor layer; and
a second conductive layer and a third conductive layer electrically connected to the oxide semiconductor layer;
a first insulating layer over the second and third conductive layers, the first insulating layer comprising a contact hole;
a color filter layer over the first insulating layer;
a second insulating layer over the color filter layer;
a partition over the second insulating layer; and
a pixel electrode electrically connected to one of the second and third conductive layers through the contact hole,wherein the pixel electrode comprises a depression portion overlapping with the contact hole,wherein the depression portion and the partition overlap each other without the second insulating layer interposed between the depression portion and the partition,wherein an end portion of the second insulating layer does not overlap with the contact hole,wherein the oxide semiconductor layer comprises a channel formation region, a first region, and a second region,wherein the first region and the second region are in contact with the second conductive layer and the third conductive layer, respectively,wherein the first region has resistance lower than resistance of the channel formation region,wherein the second region has resistance lower than resistance of the channel formation region,wherein each of the first conductive layer, the second conductive layer, and the third conductive layer contains titanium,wherein the second insulating layer is configured to reduce roughness of the color filter layer, andwherein the color filter layer does not overlap with the channel formation region.
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Abstract
An object is to improve reliability of a light-emitting device. A light-emitting device has a driver circuit portion including a transistor for a driver circuit and a pixel portion including a transistor for a pixel over one substrate. The transistor for the driver circuit and the transistor for the pixel are inverted staggered transistors each including an oxide semiconductor layer in contact with part of an oxide insulating layer. In the pixel portion, a color filter layer and a light-emitting element are provided over the oxide insulating layer. In the transistor for the driver circuit, a conductive layer overlapping with a gate electrode layer and the oxide semiconductor layer is provided over the oxide insulating layer. The gate electrode layer, a source electrode layer, and a drain electrode layer are formed using metal conductive films.
318 Citations
20 Claims
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1. A light emitting device comprising:
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a substrate; a transistor comprising; a first conductive layer over the substrate; a first oxide insulating layer over the first conductive layer; an oxide semiconductor layer over the first oxide insulating layer; a second oxide insulating layer over the oxide semiconductor layer; and a second conductive layer and a third conductive layer electrically connected to the oxide semiconductor layer; a first insulating layer over the second and third conductive layers, the first insulating layer comprising a contact hole; a color filter layer over the first insulating layer; a second insulating layer over the color filter layer; a partition over the second insulating layer; and a pixel electrode electrically connected to one of the second and third conductive layers through the contact hole, wherein the pixel electrode comprises a depression portion overlapping with the contact hole, wherein the depression portion and the partition overlap each other without the second insulating layer interposed between the depression portion and the partition, wherein an end portion of the second insulating layer does not overlap with the contact hole, wherein the oxide semiconductor layer comprises a channel formation region, a first region, and a second region, wherein the first region and the second region are in contact with the second conductive layer and the third conductive layer, respectively, wherein the first region has resistance lower than resistance of the channel formation region, wherein the second region has resistance lower than resistance of the channel formation region, wherein each of the first conductive layer, the second conductive layer, and the third conductive layer contains titanium, wherein the second insulating layer is configured to reduce roughness of the color filter layer, and wherein the color filter layer does not overlap with the channel formation region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A light emitting device comprising:
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a pixel portion comprising; a first transistor comprising a first oxide semiconductor layer; a first protective layer over the first transistor, the first protective layer comprising a contact hole; a color filter layer over the first protective layer; a second protective layer over the color filter layer; an insulating layer over the second protective layer; a partition of the insulating layer; and a pixel electrode electrically connected to the first transistor through the contact hole; and a circuit portion comprising; a second transistor comprising a second oxide semiconductor layer, wherein the pixel electrode comprises a depression portion overlapping with the contact hole, wherein the depression portion and the partition overlap each other without the insulating layer interposed between the depression portion and the partition, wherein an end portion of the insulating layer does not overlap with the contact hole, wherein the first oxide semiconductor layer comprises a first channel formation region, a first region, and a second region, wherein the first region and the second region are in contact with a first source electrode of the first transistor and a first drain electrode of the first transistor, respectively, wherein the first region has resistance lower than resistance of the first channel formation region, wherein the second region has resistance lower than resistance of the first channel formation region, wherein the second oxide semiconductor layer comprises a second channel formation region, a third region, and a fourth region, wherein the third region and the fourth region are in contact with a second source electrode of the second transistor and a second drain electrode of the second transistor, respectively, wherein the third region has resistance lower than resistance of the second channel formation region, wherein the fourth region has resistance lower than resistance of the second channel formation region, and wherein the color filter layer does not overlap with the first channel formation region. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification