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Lithographic apparatus and device manufacturing method

  • US 10,678,139 B2
  • Filed: 01/11/2019
  • Issued: 06/09/2020
  • Est. Priority Date: 06/09/2003
  • Status: Active Grant
First Claim
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1. A support apparatus for a lithographic tool comprising a projection system adapted to project a patterned beam onto a target portion of a substrate, and a liquid supply system configured to at least partly fill a space between the projection system and an object on the support apparatus, with a liquid, the support apparatus comprising:

  • a body having a recess configured to support a substrate therein; and

    a sensor capable of being positioned to be illuminated by radiation from above the body when the body and sensor is in the lithographic tool and once the radiation has passed through the liquid, a surface of a part of the sensor arranged to be essentially coplanar with a surface of, or on, the body and the sensor configured to detect the radiation.

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