Lithographic apparatus and device manufacturing method
First Claim
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1. A support apparatus for a lithographic tool comprising a projection system adapted to project a patterned beam onto a target portion of a substrate, and a liquid supply system configured to at least partly fill a space between the projection system and an object on the support apparatus, with a liquid, the support apparatus comprising:
- a body having a recess configured to support a substrate therein; and
a sensor capable of being positioned to be illuminated by radiation from above the body when the body and sensor is in the lithographic tool and once the radiation has passed through the liquid, a surface of a part of the sensor arranged to be essentially coplanar with a surface of, or on, the body and the sensor configured to detect the radiation.
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Abstract
A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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Citations
36 Claims
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1. A support apparatus for a lithographic tool comprising a projection system adapted to project a patterned beam onto a target portion of a substrate, and a liquid supply system configured to at least partly fill a space between the projection system and an object on the support apparatus, with a liquid, the support apparatus comprising:
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a body having a recess configured to support a substrate therein; and a sensor capable of being positioned to be illuminated by radiation from above the body when the body and sensor is in the lithographic tool and once the radiation has passed through the liquid, a surface of a part of the sensor arranged to be essentially coplanar with a surface of, or on, the body and the sensor configured to detect the radiation. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A substrate support for a lithographic apparatus comprising a projection system adapted to project a patterned beam onto a target portion of a substrate, and a liquid supply system configured to at least partly fill a space between the projection system and an object on the substrate support, with a liquid, the substrate support comprising:
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a body having a support surface configured to support a substrate; an edge member configured to surround an edge of the substrate, an object, or both, when positioned on the body, the edge member having a surface arranged to face toward the projection system and to be essentially coplanar with a surface of the substrate or the object; and a port to drain liquid entering a gap between the edge member and the substrate, the object, or both, the port arranged to be positioned on a side of the gap opposite the projection system. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A substrate support for a lithographic apparatus comprising a projection system adapted to project a patterned beam onto a target portion of a substrate, and a liquid supply system configured to at least partly fill a space between the projection system and an object on the substrate support, with a liquid, the substrate support comprising:
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a body having a support surface configured to support a substrate; a port to drain liquid from the liquid supply system entering a gap between an edge of the body and the substrate, an object, or both, the port arranged to be positioned on a side of the gap opposite the projection system; and a hydrophobic surface located lower than the gap and arranged to contact liquid entering the gap. - View Dependent Claims (16, 17, 18, 19, 20)
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21. A substrate support configured to hold a substrate for a projection system and a liquid supply system of a lithographic projection apparatus, the projection system configured to project a beam of radiation onto a target portion of the substrate and the liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space below the projection system and configured to confine the liquid to a localized area smaller than a surface of the substrate, the substrate support comprising:
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an edge member moveable from a surface of the substrate support, the edge member configured to at least partly surround an edge of the substrate and an object positioned on the substrate support and to provide a primary surface arranged to face the projection system, the primary surface arranged to be essentially co-planar with a primary surface of the substrate and the object; and an outlet configured to drain at least part of the liquid passing through a gap between the edge member and the substrate. - View Dependent Claims (22, 23, 24, 25, 26, 27)
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28. A movable table for a projection system and a liquid supply system of a lithographic projection apparatus, the projection system configured to project a radiation beam onto a target portion of a substrate and the liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space below the projection system and configured to confine the liquid to a localized area smaller than a surface of the substrate, the movable table comprising:
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an edge member configured to at least partly surround an edge of an object, when on the table, and to provide a primary surface arranged to face the projection system, the primary surface arranged to be essentially co-planar with a primary surface of the object; and an outlet configured to drain at least part of the liquid passing through a gap between the edge member and the object. - View Dependent Claims (29, 30, 31, 32)
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33. A movable table for a lithographic projection apparatus comprising a projection system configured to project a radiation beam onto a target portion of a substrate and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space below the projection system and configured to confine the liquid to a localized area smaller than a surface of the substrate, the movable table comprising:
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an edge member configured to at least partly surround an edge of an object, when on the table, and to provide a primary surface arranged to face the projection system, the primary surface arranged to be essentially co-planar with a primary surface of the object; and a hydrophobic surface located below the primary surfaces of the edge member and the object and arranged to contact liquid entering a gap between the edge member and the object. - View Dependent Claims (34, 35, 36)
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Specification