Gas supply manifold and method of supplying gases to chamber using same
First Claim
1. A gas inlet system in combination with a wafer processing reactor, comprising:
- a wafer processing reactor having a reaction chamber and a showerhead disposed inside the reaction chamber,a tubular gas manifold conduit having;
a lower end connected to a gas inlet port of the reaction chamber, the gas inlet port being upstream of the reaction chamber of the wafer processing reactor for supplying a gas mixed in the tubular gas manifold conduit to the showerhead,a first axial position being upstream of the lower end,a downstream position being downstream of the first axial position and upstream of the lower end, the downstream position having a first diameter and the first axial position having a second diameter, the second diameter being smaller than the first diameter, andgas feeds comprising;
a first feed for feeding a first gas into the tubular gas manifold conduit to the downstream position anda second feed for feeding a second gas, which is different from the first gas, into the tubular gas manifold conduit to the downstream position, the first and the second feeds each having two or more injection ports attached to the tubular gas manifold conduit at the first axial position of the tubular gas manifold conduit such that the first gas and the second gas are separately fed into the tubular gas manifold conduit at the first axial position,wherein the injection ports of the first feed and the injection ports of the second feed are evenly distributed along the circumference of the second diameter and coplanar with the second diameter at the first axial position, andwherein the injection ports of the first feed and the injection ports of the second feed open into the tubular gas manifold conduit at the first axial position to feed the first and second gases to the downstream position.
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Accused Products
Abstract
A gas inlet system for a wafer processing reactor includes a tubular gas manifold conduit adapted to be connected to a gas inlet port of the wafer processing reactor; and gas feeds including a first feed for feeding a first gas into the tubular gas manifold conduit and a second feed for feeding a second gas into the tubular gas manifold conduit. Each feed has two or more injection ports connected to the tubular gas manifold conduit at a first axial position of the tubular gas manifold conduit, and the injection ports of each of the gas feeds are evenly distributed along a circumference of the tubular gas manifold conduit at the first axial position.
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Citations
20 Claims
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1. A gas inlet system in combination with a wafer processing reactor, comprising:
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a wafer processing reactor having a reaction chamber and a showerhead disposed inside the reaction chamber, a tubular gas manifold conduit having; a lower end connected to a gas inlet port of the reaction chamber, the gas inlet port being upstream of the reaction chamber of the wafer processing reactor for supplying a gas mixed in the tubular gas manifold conduit to the showerhead, a first axial position being upstream of the lower end, a downstream position being downstream of the first axial position and upstream of the lower end, the downstream position having a first diameter and the first axial position having a second diameter, the second diameter being smaller than the first diameter, and gas feeds comprising; a first feed for feeding a first gas into the tubular gas manifold conduit to the downstream position and a second feed for feeding a second gas, which is different from the first gas, into the tubular gas manifold conduit to the downstream position, the first and the second feeds each having two or more injection ports attached to the tubular gas manifold conduit at the first axial position of the tubular gas manifold conduit such that the first gas and the second gas are separately fed into the tubular gas manifold conduit at the first axial position, wherein the injection ports of the first feed and the injection ports of the second feed are evenly distributed along the circumference of the second diameter and coplanar with the second diameter at the first axial position, and wherein the injection ports of the first feed and the injection ports of the second feed open into the tubular gas manifold conduit at the first axial position to feed the first and second gases to the downstream position. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification