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Workpiece processing chamber having a rotary microwave plasma antenna with slotted spiral waveguide

  • US 10,685,812 B2
  • Filed: 02/27/2018
  • Issued: 06/16/2020
  • Est. Priority Date: 01/07/2015
  • Status: Active Grant
First Claim
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1. A reactor for processing a workpiece comprising:

  • a chamber and a workpiece support surface in said chamber;

    a rotary coupling comprising a stationary stage and a rotatable stage having an axis of rotation;

    a microwave source coupled to said stationary stage;

    a rotation actuator;

    a microwave antenna coupled to said rotation actuator and overlying said chamber, said microwave antenna comprising;

    a floor and a ceiling defining a planar region therebetween;

    a first spiral wall extending between said floor and said ceiling and having a spiral axis corresponding to said axis of rotation, said first spiral wall defining a first spiral conduit that spirals radially inwardly making at least a revolution around said spiral axis in the planar region from a first conduit end to a second conduit end such that microwave energy fed into said first spiral conduit flows azimuthally in the planar region through the first spiral conduit;

    first plural ports in said floor spaced apart along the length of said first spiral conduit;

    a distributor waveguide positioned above the ceiling and comprising an input and a first output coupled to said first spiral conduit; and

    an axial conduit coaxial with the axis of rotation, said axial conduit having a lower end coupled to the input of the distributor waveguide and an upper end coupled to said rotatable stage and configured to receive microwave energy from the microwave source through the rotary coupling while the rotation actuator causes the microwave antenna including the floor, ceiling, distributor waveguide and axial conduit to rotate.

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