Advanced optical sensor and method for detecting an optical event in a light emission signal in a plasma chamber
First Claim
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1. A method for detection of optical events in a plasma processing system, the method comprising:
- detecting at least one light emission signal, via one or more optical detectors, from a detection area in a plasma processing chamber, the at least one detected light emission signal including light emissions from an optical event and representing an emission intensity in time domain; and
detecting a signature of the optical event from the at least one detected light emission signal, whereinthe detection area is divided into multiple overlapping areas in one direction, each one of the multiple overlapping areas in the one direction being covered by a channel of the one or more optical detectors.
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Abstract
An advanced optical sensor and method for detection of optical events in a plasma processing system. The method includes detecting at least one light emission signal in a plasma processing chamber. The at least one detected light emission signal including light emissions from an optical event. The method further includes processing the at least one light emission signal and detecting a signature of the optical event from the processed light emission signal.
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Citations
23 Claims
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1. A method for detection of optical events in a plasma processing system, the method comprising:
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detecting at least one light emission signal, via one or more optical detectors, from a detection area in a plasma processing chamber, the at least one detected light emission signal including light emissions from an optical event and representing an emission intensity in time domain; and detecting a signature of the optical event from the at least one detected light emission signal, wherein the detection area is divided into multiple overlapping areas in one direction, each one of the multiple overlapping areas in the one direction being covered by a channel of the one or more optical detectors. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. An apparatus for detection of optical events in a plasma processing system, comprising:
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a window disposed on a plasma processing chamber of the plasma processing system, for providing optical access to the plasma processing chamber; at least one optical detector for detecting light emission signal from an optical event from a detection area in the plasma processing chamber via a light collector, the light emission signal representing an emission intensity in time domain; and a controller configured to detect a signature of the optical event from the at least one detected light emission signal, wherein the detection area is divided into multiple overlapping areas in one direction, each one of the multiple overlapping areas in the one direction being covered by a channel of the at least one optical detector.
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23. A system for plasma processing, comprising:
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a plasma processing chamber; at least one optical detector for detecting light emission from an optical event from a detection area in the plasma processing chamber via a light collector; and a controller configured to detect a signature of the optical event from, an intensity of the detected light emission in time domain wherein the detection area is divided into multiple overlapping areas in one direction, each one of the multiple overlapping areas in the one direction being covered by a channel of the at least one optical detector.
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Specification