Array substrate and fabricating method thereof
First Claim
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1. An array substrate having a display area and a peripheral area, comprising:
- a base substrate;
a plurality of first thin film transistors on the base substrate and respectively in a plurality of subpixels in the display area; and
a plurality of second thin film transistors on the base substrate and in the peripheral area;
wherein an oxygen content in active layers of the plurality of first thin film transistors is higher than that in active layers of the plurality of second thin film transistors;
a respective one of the plurality of first thin film transistors has a substantially uniform oxygen content across an entirety of a surface of an active layer of the respective one of the plurality of first thin film transistors away from the base substrate; and
a respective one of the plurality of second thin film transistors has a substantially uniform oxygen content across an entirety of a surface of an active layer of the respective one of the plurality of second thin film transistors away from the base substrate.
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Abstract
The present application discloses an array substrate having a display area and a peripheral area. The array substrate includes a plurality of first thin film transistors respectively in a plurality of subpixels in the display area; and a plurality of second thin film transistors in the peripheral area, an oxygen content in active layers of the plurality of first thin film transistors being higher than that in active layers of the plurality of second thin film transistors.
12 Citations
19 Claims
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1. An array substrate having a display area and a peripheral area, comprising:
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a base substrate; a plurality of first thin film transistors on the base substrate and respectively in a plurality of subpixels in the display area; and a plurality of second thin film transistors on the base substrate and in the peripheral area; wherein an oxygen content in active layers of the plurality of first thin film transistors is higher than that in active layers of the plurality of second thin film transistors; a respective one of the plurality of first thin film transistors has a substantially uniform oxygen content across an entirety of a surface of an active layer of the respective one of the plurality of first thin film transistors away from the base substrate; and a respective one of the plurality of second thin film transistors has a substantially uniform oxygen content across an entirety of a surface of an active layer of the respective one of the plurality of second thin film transistors away from the base substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method of fabricating an array substrate having a display area and a peripheral area, comprising:
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forming a plurality of first thin film transistors respectively in a plurality of subpixels in the display area and a plurality of second thin film transistors in the peripheral area; wherein the plurality of first thin film transistors are formed to have a higher oxygen content in active layers of the plurality of first thin film transistors than that in active layers of the plurality of second thin film transistors; substantially an entirety of an active layer of a respective one of the plurality of first thin film transistors is formed to has a substantially uniform oxygen content; and substantially an entirety of an active layer of a respective one of the plurality of second thin film transistors is formed to has a substantially uniform oxygen content. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification