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Compositions and methods for the deposition of silicon oxide films

  • US 10,703,915 B2
  • Filed: 09/08/2017
  • Issued: 07/07/2020
  • Est. Priority Date: 09/19/2016
  • Status: Active Grant
First Claim
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1. A method of depositing a film comprising silicon and oxygen onto a substrate, the method comprising the steps of:

  • a) providing a substrate in a reactor;

    b) introducing into the reactor at least one silicon precursor compound, wherein the at least one silicon precursor compound is selected from the group consisting of Formulae A and B;

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