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Semiconductor reaction chamber showerhead

  • US 10,714,315 B2
  • Filed: 10/12/2012
  • Issued: 07/14/2020
  • Est. Priority Date: 10/12/2012
  • Status: Active Grant
First Claim
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1. A showerhead comprising:

  • a base plate comprising a least a portion of an exhaust channel and having an opening and a plurality of base plate slots;

    a middle plate positioned within the opening and having a plurality of middle plate slots and protrusions, the protrusions each comprising a protrusion slot; and

    ,an upper plate comprising a top surface having a plurality of cooling fins formed therein, a first gas hole and a second gas hole,wherein the first gas hole conveys a first gas into a first gas cavity and the second gas hole conveys a second gas into a second gas cavity,wherein each of the plurality of base plate slots is concentrically aligned with the plurality of middle plate slots,wherein the first gas cavity is defined between the upper plate and the middle plate and the second gas cavity is defined between the middle plate and the base plate,wherein the first gas cavity and the second gas cavity are fluidly coupled to the exhaust channel,wherein a first gas purge channel extends from the first gas cavity, wherein the first gas purge channel feeds into a first plenum, wherein the first plenum is coupled to a first valve,wherein a second gas purge channel extends from the second gas cavity, wherein the second gas purge channel feeds into a second plenum, wherein the second plenum is coupled to a second valve,wherein one of the first and second valves is configured to provide a purge gas into the first or second gas cavity,wherein the other of the first and second valves is configured to provide a negative pressure to the first or second gas cavity,wherein the first gas purge channel extends from the first gas cavity through an opening that is separate from the first gas hole,wherein the second gas purge channel extends from the second gas cavity through an opening that is separate from the second gas hole,wherein the first and second gas purge channels do not convey the first gas or the second gas into the first and second gas cavities,wherein the first gas cavity is in fluid communication with the first gas hole and the second gas cavity is in fluid communication with the second gas hole,wherein the protrusions extend into the base plate slots,wherein a gap is formed between each protrusion and each base plate slot and the gap is in fluid communication with the second gas cavity,wherein the protrusion slots are in fluid communication with the first gas cavity,wherein the protrusion slots comprise a first radius extending through a portion of the protrusion and a second radius that is smaller than the first radius extending through another portion of the protrusion,wherein the protrusions extend to at least a bottom surface of the base plate slots, andwherein the gap terminates at the bottom surface.

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