Display device and method of manufacturing the same
First Claim
1. A method of manufacturing a display device, the method comprising:
- forming a thin film transistor on a substrate, the thin film transistor comprising a semiconductor layer made of a metal oxide;
forming a first passivation layer on the thin film transistor;
forming an organic insulation layer on the first passivation layer in which an auxiliary wire is placed within the organic insulation layer;
forming a contact hole in the organic insulation layer to expose the auxiliary wire;
forming a common electrode in the contact hole and on the organic insulation layer, the common electrode connected with the auxiliary wire to transmit a touch sensing signal;
forming a second passivation layer on the common electrode;
forming a pixel electrode on the second passivation layer;
forming a third passivation layer on the pixel electrode, the third passivation layer thinner than the first passivation layer and the second passivation layer; and
forming a lower photo alignment layer on the third passivation layer,wherein the third passivation layer includes a higher resistivity than the lower photo alignment layer, and wherein the third passivation layer has a multi-layered structure.
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Accused Products
Abstract
A display device optimized to operate in a low frame rate mode under certain predetermined conditions is provided. To reduce pixel discharge during the low frame rate mode, the display device employees the TFTs with metal oxide semiconductor layer, the optical alignment layer with an upper portion and a lower portion having different resistivity. In addition, a passivation layer is provided between the optical alignment layer and the pixel or the common electrode for compensating the low resistivity of the lower portion of the optical alignment layer. As such, various visual defects associated with the pixel discharge can be reduced even when the display device is operating under the low frame rate mode.
38 Citations
14 Claims
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1. A method of manufacturing a display device, the method comprising:
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forming a thin film transistor on a substrate, the thin film transistor comprising a semiconductor layer made of a metal oxide; forming a first passivation layer on the thin film transistor; forming an organic insulation layer on the first passivation layer in which an auxiliary wire is placed within the organic insulation layer; forming a contact hole in the organic insulation layer to expose the auxiliary wire; forming a common electrode in the contact hole and on the organic insulation layer, the common electrode connected with the auxiliary wire to transmit a touch sensing signal; forming a second passivation layer on the common electrode; forming a pixel electrode on the second passivation layer; forming a third passivation layer on the pixel electrode, the third passivation layer thinner than the first passivation layer and the second passivation layer; and forming a lower photo alignment layer on the third passivation layer, wherein the third passivation layer includes a higher resistivity than the lower photo alignment layer, and wherein the third passivation layer has a multi-layered structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification