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Display device and method of manufacturing the same

  • US 10,727,255 B2
  • Filed: 11/13/2018
  • Issued: 07/28/2020
  • Est. Priority Date: 07/25/2014
  • Status: Active Grant
First Claim
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1. A method of manufacturing a display device, the method comprising:

  • forming a thin film transistor on a substrate, the thin film transistor comprising a semiconductor layer made of a metal oxide;

    forming a first passivation layer on the thin film transistor;

    forming an organic insulation layer on the first passivation layer in which an auxiliary wire is placed within the organic insulation layer;

    forming a contact hole in the organic insulation layer to expose the auxiliary wire;

    forming a common electrode in the contact hole and on the organic insulation layer, the common electrode connected with the auxiliary wire to transmit a touch sensing signal;

    forming a second passivation layer on the common electrode;

    forming a pixel electrode on the second passivation layer;

    forming a third passivation layer on the pixel electrode, the third passivation layer thinner than the first passivation layer and the second passivation layer; and

    forming a lower photo alignment layer on the third passivation layer,wherein the third passivation layer includes a higher resistivity than the lower photo alignment layer, and wherein the third passivation layer has a multi-layered structure.

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