Electromagnetic radiation enhancement methods and systems

• US 10,732,422 B2
• Filed: 01/04/2019
• Issued: 08/04/2020
• Est. Priority Date: 01/20/2014
• Status: Active Grant

• Current Assignee: Michael G. Soskind, Rose A. Soskind, Yakov G. Soskind
• Original Assignee: Michael G. Soskind, Rose A. Soskind, Yakov G. Soskind
• Inventors: Soskind, Yakov G., Soskind, Michael G., Soskind, Rose A.
• Primary Examiner(s): Beatty, Collin X
• Application Number:
  US16/239,838
• Publication Number:
  US 20190137769A1
• Time in Patent Office: 578 Days
• Field of Search: 430 5, 430394, 430396, 359305, 359 1, 359238, 359350, 359637, 716 50, 438551, 438553, 438671, 438717, 438736, 438942, 438943, 438945, 438947, 438950
• CPC Class Codes: G02B 27/0927 Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
• CPC Class Codes: G02B 27/0955 Lenses lenses per se G02B3/00
• CPC Class Codes: G02B 27/0983 being curved
• CPC Class Codes: G02B 27/0988 Diaphragms, spatial filters, masks for removing or filtering a part of the beam
• CPC Class Codes: G02B 5/3083 Birefringent or phase retarding elements G02B5/3008, G02B5/3016 take precedence; systems for polarisation control G02B27/286; manufacturing phase modulating patterns by lithographic processes G03F7/001
• CPC Class Codes: G02B 5/3091 for use in the UV
• CPC Class Codes: G03F 7/70325 Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses

Abstract

An optical system for producing electromagnetic radiation with localized increases in irradiance or radiance at the system output includes a first optical mask containing localized regions for producing controlled modifications of phase delays and/or amplitude attenuations and located within the input plane of said optical system. The system also includes at least a single optical component with positive optical power located after the input plane and at least one additional optical mask located after the optical component at non-conjugate locations with respect to the input plane of the system. The additional optical mask contains localized regions for producing controlled modifications of phase delays. Locally increased radiation distributions are produced at the system output.

Claims

1. An optical system for producing electromagnetic radiation with localized increases in irradiance or radiance at the system output based on diffraction of said radiation by spatially localized amplitude and phase structures within at least two non-conjugate spatial locations, comprising:

a first optical mask containing localized regions for producing controlled, localized modifications of phase delays and/or amplitude attenuations of a fraction of the electromagnetic radiation and located within said first non-conjugate spatial location of the optical system;

at least a single optical element with positive optical power located after said first spatial location;

at least one additional optical mask located after said optical element at non-conjugate location placed within the far field region with respect to location of the said first mask and containing localized regions for producing controlled localized modifications of a fraction of the electromagnetic radiation; and

a system output where said high output intensity peaks of electromagnetic radiation are produced.

2. The optical system in accordance with claim 1, wherein said optical element with positive optical power is constituted by at least one lens.

3. The optical system in accordance with claim 1, wherein said optical element with positive optical power is constituted by at least one mirror.

4. The optical system in accordance with claim 1, wherein said optical element with positive optical power is constituted by a combination of lenses and mirrors.

5. The optical system in accordance with claim 1, wherein said first optical mask contains localized transmissive regions.

6. The optical system in accordance with claim 5, wherein said first optical mask contains a means to locally adjust the phase delay and/or amplitude attenuation of electromagnetic radiation within said localized transmissive regions.

7. The optical system in accordance with claim 5, wherein the phase delay produced by said localized transmissive regions of the first optical mask equals jλ

/2, where j is an odd integer, and λ

is the radiation wavelength.

8. The optical system in accordance with claim 1, wherein said first mask contains localized reflective regions.

9. The optical system in accordance with claim 8, wherein said first optical mask contains means for locally adjusting the phase delay and/or reflectivity of the incoming radiation within the said localized reflective regions.

10. The optical system in accordance with claim 8, wherein the phase delay produced by said localized reflective regions of the first optical mask equals jλ

/2, where j is an odd integer, and λ

is the radiation wavelength.

11. The optical system in accordance with claim 1, wherein said at least one additional optical mask, placed within the far field region with respect to the said first mask, contains localized transmissive regions.

12. The optical system in accordance with claim 11, wherein said at least one additional optical mask placed within the far field region with respect to the said first mask contains means for locally adjusting the phase delay of the radiation within said localized transmissive regions.

13. The optical system in accordance with claim 1, wherein said at least one additional optical mask placed within the far field region with respect to the said first mask contains localized reflective regions.

14. The optical system in accordance with claim 13, wherein said at least one additional optical mask placed within the far field region with respect to the said first mask contains means for locally adjusting the phase delay of the reflected radiation within the said localized reflective regions.

15. The optical system in accordance with claim 1, containing a means for adjusting the lateral position of said first optical mask within the said first location of the optical system.

16. The optical system in accordance with claim 1, wherein said at least one additional optical mask placed within the far field region with respect to the said first mask is located at the stop of the optical system.

17. The optical system in accordance with claim 1, wherein the localized phase delay of the radiation produced by the said at least one additional optical mask placed within the far field region with respect to the said first mask equals jλ

/2, where j is an odd integer, and λ

is the radiation wavelength.

18. The optical system in accordance with claim 1, containing at least one optical element having optical power and located after said at least one additional optical mask placed within the far-field region with respect to said first optical mask.

19. The optical system in accordance with claim 18, wherein said at least one optical element having optical power is placed at a focal distance after said at least one additional optical mask.

20. The optical system in accordance with claim 18, further comprising at least one additional optical mask located after said at least one optical element with optical power.

21. The optical system in accordance with claim 20, wherein said at least one additional optical mask is located after said at least one optical element with optical power at the conjugate location with respect to the first optical mask.

22. The optical system in accordance with claim 21, wherein said at least one additional optical mask is located at the focal plane of said at least one additional optical element with optical power.

23. The optical system in accordance with claim 20, containing an optical element having optical power and located after said at least one additional optical mask.

24. The optical system in accordance with claim 23, wherein said optical element having optical power is located at the focal distance after said at least one additional optical mask.

25. The optical system in accordance with claim 1, wherein the said system output where high output intensity peaks of electromagnetic radiation are produced is remotely located in the far field of said optical system.