Dual-pattern optical 3D dimensioning
First Claim
Patent Images
1. A dimensioning assembly, comprising:
- a first pattern generator having a first laser diode and a first pattern projection assembly, wherein the first pattern generator is configured to generate a first representation of a pattern, and wherein the first representation includes a plurality of first elements;
a second pattern generator, spaced apart from the first pattern generator, having a second laser diode and a second pattern projection assembly, wherein the second pattern generator is configured to generate a second representation of the pattern, wherein the second representation includes a plurality of second elements, wherein the first representation of the pattern and the second representation of the pattern are identical and wherein the first representation of the pattern and the second representation of the pattern are associated with a predetermined image separation, and wherein a first element in the plurality of first elements is positioned equivalent as a second element in the plurality of second elements;
a camera module, positioned between the first pattern generator and the second pattern generator, having one or more image sensors and an imaging lens assembly, wherein the camera module is configured to capture an image comprising the first representation of the pattern and the second representation of the pattern to generate a captured image; and
a processing system configured to determine a depth of an object based on a ratio of the image separation between the first element of the first representation of the pattern and the second element of the second representation of the pattern in the captured image and an image distance between (1) the first element and another first-pattern element adjacent to the first element, or (2) the second element and another second-pattern element adjacent to the second element.
1 Assignment
0 Petitions
Accused Products
Abstract
An optical dimensioning system includes light emitting assemblies configured to project a predetermined pattern on an object. The optical dimensioning system further includes an imaging assembly configured to sense light scattered and/or reflected of the object, and to capture an image of the object while the pattern is projected. A processing assembly, in the optical dimensioning system, is configured to analyze the image of the object to determine one or more dimension parameters of the object.
-
Citations
20 Claims
-
1. A dimensioning assembly, comprising:
-
a first pattern generator having a first laser diode and a first pattern projection assembly, wherein the first pattern generator is configured to generate a first representation of a pattern, and wherein the first representation includes a plurality of first elements; a second pattern generator, spaced apart from the first pattern generator, having a second laser diode and a second pattern projection assembly, wherein the second pattern generator is configured to generate a second representation of the pattern, wherein the second representation includes a plurality of second elements, wherein the first representation of the pattern and the second representation of the pattern are identical and wherein the first representation of the pattern and the second representation of the pattern are associated with a predetermined image separation, and wherein a first element in the plurality of first elements is positioned equivalent as a second element in the plurality of second elements; a camera module, positioned between the first pattern generator and the second pattern generator, having one or more image sensors and an imaging lens assembly, wherein the camera module is configured to capture an image comprising the first representation of the pattern and the second representation of the pattern to generate a captured image; and a processing system configured to determine a depth of an object based on a ratio of the image separation between the first element of the first representation of the pattern and the second element of the second representation of the pattern in the captured image and an image distance between (1) the first element and another first-pattern element adjacent to the first element, or (2) the second element and another second-pattern element adjacent to the second element. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
-
9. An optical dimensioning system, comprising:
-
one or more light emitting assemblies configured to project a first representation of a pattern and a second representation of the pattern on an object, wherein the first representation of the pattern includes a plurality of first elements and the second representation of the pattern includes a plurality of second elements, wherein the first representation and the second representation are identical and wherein the first representation of the pattern and the second representation of the pattern are associated with a predetermined image separation, and wherein a first element in the plurality of first elements is positioned equivalent as a second element in the plurality of second elements; an imaging assembly configured to sense light scattered and/or reflected of the object, and to capture an image of the object while the first representation of the pattern and the second representation of the pattern are projected; and a processing assembly configured to analyze the image of object to determine one or more dimension parameters of the object based on a ratio of image separation between the first element and the second element in the image and an image distance between (1) the first element and another first-pattern element adjacent to the first element, or (2) the second element and another second-pattern element adjacent to the second element. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
-
-
17. A method for dual-pattern optical dimensioning, comprising:
-
illuminating an object with a first representation of a pattern and a second representation of the pattern projected by one or more pattern generators, wherein the first representation includes a plurality of first elements and the second representation includes a plurality of second elements, wherein the first representation and the second representation are identical and wherein the first representation of the pattern and the second representation of the pattern are associated with a predetermined image separation, and wherein a first element in the plurality of first elements is positioned equivalent as a second element in the plurality of second elements; capturing an image of the object, illuminated by the first representation of the pattern and the second representation of the pattern, with a camera assembly; and calculating dimensions of the based on a ratio of the image separation between the first element and the second element in the image and an image distance between (1) the first element and another first-pattern element adjacent to the first element, or (2) the second element and another second-pattern element adjacent to the second element. - View Dependent Claims (18, 19, 20)
-
Specification