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Methods, structures, and designs for self-aligning local interconnects used in integrated circuits

  • US 10,734,383 B2
  • Filed: 01/02/2018
  • Issued: 08/04/2020
  • Est. Priority Date: 10/26/2007
  • Status: Active Grant
First Claim
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1. An integrated circuit, comprising:

  • a local interconnect conductive structure including a first portion and a second portion, the first portion of the local interconnect conductive structure having a substantially rectangular shape with a length measured in a first direction and a width measured in a second direction, the second portion of the local interconnect conductive structure having a substantially rectangular shape with a length measured in the second direction and a width measured in the first direction, the second portion of the local interconnect conductive structure connected to the first portion of the local interconnect conductive structure at a location in the second direction between neighboring gate electrode level conductive structures, wherein the first portion of the local interconnect structure is self-aligned between the neighboring gate electrode level conductive structures.

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