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First Claim
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1. A device having at least one active matrix panel, said active matrix panel comprising:
- a substrate having an insulating surface;
an active matrix circuit comprising first thin film transistors formed over said substrate;
a driving circuit comprising second thin film transistors for driving said active matrix circuit;
a first interlayer insulating film formed over the first and second thin film transistors;
an electromagnetic shield pattern formed over said first interlayer insulating film;
a second interlayer insulating film formed over said first interlayer insulating film and said electromagnetic shield pattern; and
reflective pixel electrodes formed over said second interlayer insulating film and electrically connected to the first thin film transistors.
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Abstract
There is disclosed a structure for radiating heat generated by TFTs in a liquid crystal panel. A DLC film 125 is provided on a resin interlayer film 123 disposed on the TFTs 105, 109, and 113. The DLC film 125 can be easily formed on the resin film, and has high heat conductivity, so that the film can be made to function as a heat radiating layer.
95 Citations
108 Claims
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1. A device having at least one active matrix panel, said active matrix panel comprising:
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a substrate having an insulating surface;
an active matrix circuit comprising first thin film transistors formed over said substrate;
a driving circuit comprising second thin film transistors for driving said active matrix circuit;
a first interlayer insulating film formed over the first and second thin film transistors;
an electromagnetic shield pattern formed over said first interlayer insulating film;
a second interlayer insulating film formed over said first interlayer insulating film and said electromagnetic shield pattern; and
reflective pixel electrodes formed over said second interlayer insulating film and electrically connected to the first thin film transistors. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A device having at least one active matrix panel, said active matrix panel comprising:
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a substrate having an insulating surface;
an active matrix circuit comprising first thin film transistors formed over said substrate;
a driving circuit comprising second thin film transistors for driving said active matrix circuit;
a first interlayer insulating film formed over the first and second thin film transistors;
at least one wiring formed on said first interlayer insulating film and electrically connected to one of source or drain of at least one of said first and second thin film transistors through a contact hole of said first interlayer insulating film;
a second interlayer insulating film comprising an organic resin formed over said first interlayer insulating film and said wiring;
an electromagnetic shield pattern formed over said first interlayer insulating film;
a third interlayer insulating film formed over said first interlayer insulating film and said electromagnetic shield pattern; and
reflective pixel electrodes formed over said second interlayer insulating film and electrically connected to the first thin film transistors. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28)
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29. A device having at least one active matrix panel, said active matrix panel comprising:
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a substrate having an insulating surface;
an active matrix circuit comprising first thin film transistors formed over said substrate;
a driving circuit comprising second thin film transistors for driving said active matrix circuit;
a first interlayer insulating film formed over the first and second thin film transistors;
at least one wiring formed on said first interlayer insulating film and electrically connected to one of source or drain of at least one of said first and second thin film transistors through a contact hole of said first interlayer insulating film;
a second interlayer insulating film formed over said first interlayer insulating film and said wiring;
an electromagnetic shield pattern formed over said first interlayer insulating film;
a third interlayer insulating film comprising an organic resin formed over said second interlayer insulating film and said electromagnetic shield pattern; and
reflective pixel electrodes formed over said third interlayer insulating film and electrically connected to the first thin film transistors. - View Dependent Claims (30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45)
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46. A device having at least one active matrix panel, said active matrix panel comprising:
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a substrate having an insulating surface;
an active matrix circuit comprising first thin film transistors formed over said substrate;
a driving circuit comprising second thin film transistors for driving said active matrix circuit;
a first interlayer insulating film formed over the first and second thin film transistors;
at least one drain electrode formed on said first interlayer insulating film and electrically connected to drain of at least one of said first thin film transistors through a contact hole of said first interlayer insulating film;
a second interlayer insulating film formed over said first interlayer insulating film and said wiring;
an electromagnetic shield pattern formed over said first interlayer insulating film;
a third interlayer insulating film comprising an organic resin formed over said first interlayer insulating film and said electromagnetic shield pattern; and
at least one reflective pixel electrode formed over said third interlayer insulating film and electrically connected to said drain electrode through a hole opened through said third interlayer insulating film, said electromagnetic shield pattern and said second interlayer insulating film, wherein said third interlayer insulating film extends into a gap between said reflective pixel electrode and an inner edge of the opening of said electromagnetic shield pattern. - View Dependent Claims (47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61)
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62. A device having at least one active matrix panel, said active matrix panel comprising:
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a substrate having an insulating surface;
an active matrix circuit comprising first thin film transistors formed over said substrate;
a driving circuit comprising second thin film transistors for driving said active matrix circuit;
a first interlayer insulating film formed over the first and second thin film transistors;
at least one drain electrode formed on said first interlayer insulating film and electrically connected to a drain of at least one of said first thin film transistors through a contact hole of said first interlayer insulating film;
a second interlayer insulating film comprising an organic resin formed over said first interlayer insulating film and said drain electrode;
at least one pixel electrode formed over said second interlayer insulating film and electrically connected to one of the first thin film transistors via said drain electrode, wherein an insulating layer comprising silicon nitride is formed between said second interlayer insulating film and each of said first interlayer insulating film and said at least one drain electrode. - View Dependent Claims (63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75)
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76. A device having at least one active matrix panel, said active matrix panel comprising:
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a substrate having an insulating surface;
an active matrix circuit comprising first thin film transistors formed over said substrate;
a driving circuit comprising second thin film transistors for driving said active matrix circuit;
a first interlayer insulating film formed over the first and second thin film transistors;
at least one wiring formed on said first interlayer insulating film and electrically connected to one of source or drain of at least one of said first and second thin film transistors through a contact hole of said first interlayer insulating film;
a second interlayer insulating film comprising an organic resin formed over said first interlayer insulating film and said wiring;
at least one pixel electrode formed over said second interlayer insulating film and electrically connected to one of the first thin film transistors, wherein an insulating layer comprising silicon nitride is formed between said second interlayer insulating film and each of said first interlayer insulating film and said at least one wiring. - View Dependent Claims (77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89)
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90. A device having at least one active matrix panel, said active matrix panel comprising:
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a substrate having an insulating surface;
an active matrix circuit comprising first thin film transistors formed over said substrate;
a driving circuit comprising second thin film transistors for driving said active matrix circuit;
a first interlayer insulating film formed over the first and second thin film transistors;
at least one first electrode formed on said first interlayer insulating film and electrically connected to said first thin film transistors;
at least one second electrode formed on said first interlayer insulating film and electrically connected to said second thin film transistors;
a second interlayer insulating film comprising an organic resin formed over said first interlayer insulating film and said wiring;
at least one pixel electrode formed over said second interlayer insulating film and electrically connected to one of the first thin film transistors, wherein an insulating layer comprising silicon nitride is formed on said first interlayer insulating film, said at least one first electrode and said at least second electrode. - View Dependent Claims (91, 92, 93, 94, 95, 96, 97, 98)
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99. A device having at least one active matrix panel, said active matrix panel comprising:
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a substrate having an insulating surface;
an active matrix circuit comprising first thin film transistors formed over said substrate;
a driving circuit comprising second thin film transistors for driving said active matrix circuit;
a first interlayer insulating film formed over the first and second thin film transistors;
at least one first electrode formed on said first interlayer insulating film and electrically connected to said first thin film transistors;
at least one second electrode formed on said first interlayer insulating film and electrically connected to said second thin film transistors;
a second interlayer insulating film comprising an organic resin formed over said first interlayer insulating film and said wiring;
an electromagnetic shield pattern formed on said second interlayer insulating film;
a third interlayer insulating film formed over said second interlayer insulating film and said electromagnetic shield pattern; and
at least one pixel electrode formed over said third interlayer insulating film and electrically connected to one of the first thin film transistors, wherein an insulating layer comprising silicon nitride is formed on said first interlayer insulating film, said at least one first electrode and said at least second electrode. - View Dependent Claims (100, 101, 102, 103, 104, 105, 106)
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107. A device having at least one active matrix panel, said active matrix panel comprising:
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a substrate having an insulating surface;
an active matrix circuit comprising first thin film transistors formed over said substrate;
a driving circuit comprising second thin film transistors for driving said active matrix circuit;
a first interlayer insulating film formed over the first and second thin film transistors;
at least one first electrode formed on said first interlayer insulating film and electrically connected to said first thin film transistors;
at least one second electrode formed on said first interlayer insulating film and electrically connected to said second thin film transistors;
an insulating layer formed on said first interlayer insulating film and covering said first electrode and said second electrode wherein said insulating film comprises silicon nitride;
a capacitor forming electrode formed on said insulating layer comprising silicon nitride to form a capacitor associated with said first thin film transistor;
a second interlayer insulating film comprising an organic resin formed on said insulating layer comprising silicon nitride and said capacitor forming electrode;
at least one pixel electrode formed over said second interlayer insulating film and electrically connected to one of the first thin film transistors.
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108. A device having at least one active matrix panel, said active matrix panel comprising:
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a substrate having an insulating surface;
an active matrix circuit comprising first thin film transistors formed over said substrate;
a driving circuit comprising second thin film transistors for driving said active matrix circuit;
a first interlayer insulating film formed over the first and second thin film transistors;
at least one wiring formed on said first interlayer insulating film and electrically connected to at least one of said first and second thin film transistors;
an insulating layer comprising silicon nitride formed on said first interlayer insulating film and said at least one wiring;
a second interlayer insulating film comprising an organic resin formed over said first interlayer insulating film and said wiring with said insulating layer interposed therebetween;
an electromagnetic shield pattern formed on said second interlayer insulating film;
a third interlayer insulating film comprising an organic resin formed over said second interlayer insulating film and said electromagnetic shield pattern; and
at least one pixel electrode formed over said third interlayer insulating film and electrically connected to one of the first thin film transistors.
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Specification