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Low pressure vapor phase deposition of organic thin films

  • US 20010002279A1
  • Filed: 12/13/2000
  • Published: 05/31/2001
  • Est. Priority Date: 11/17/1997
  • Status: Abandoned Application
First Claim
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1. A method for preparing an organic thin film on a substrate, said method comprising the steps of:

  • providing a plurality of organic precursors, said organic precursors being in the vapor phase; and

    reacting said plurality of organic precursors at a sub-atmospheric pressure in the presence of said substrate to form said thin film on said substrate.

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