Positioning mark and alignment method using the same
First Claim
Patent Images
1. A positioning apparatus comprising:
- a substrate for a printed circuit board; and
a positioning mark formed on said substrate, said positioning mark including a plurality of substantially circular holes.
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Abstract
Each positioning mark comprises a plurality of mark elements. The mark elements are adapted to be individually determined for their respective positions and configurations. A reference point of the positioning mark is located on the basis of data obtained by determining respective positions and configurations of the mark elements.
16 Citations
12 Claims
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1. A positioning apparatus comprising:
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a substrate for a printed circuit board; and
a positioning mark formed on said substrate, said positioning mark including a plurality of substantially circular holes. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of positional alignment comprising:
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forming a plurality of positioning marks at positions spaced apart from one another on a substrate for a printed circuit board, each of the positioning marks including a plurality of substantially circular holes, and the plurality of positioning marks formed on the substrate comprising a first set of alignment marks;
forming a plurality of positioning marks on a photo-mask at respective positions corresponding to the positions of the first set of alignment marks, the plurality of positioning marks formed on the photo-mask comprising a second set of alignment marks, wherein at least a portion of the photo-mask whereon the positioning marks are formed is optically transparent;
arranging the substrate and the photo-mask in a close adjacent relationship, whereat the first set of alignment marks and the second set of alignment marks overlap each other so as to form a plurality of pairs of overlapping first and second alignment marks;
determining respective positions of each alignment mark in each pair of overlapping first and second alignment marks;
obtaining an amount of misalignment between each alignment mark in each pair of overlapping first and second alignment marks based on said determining of the respective positions of each alignment mark in each pair of overlapping first and second alignment marks; and
moving one of said substrate and said photo-mask in at least one of an X-direction, a Y-direction, and a Theta-direction based on the amount of misalignment so as to align the substrate and the photo-mask. - View Dependent Claims (11, 12)
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Specification