Liquid processing apparatus and method

• US 20010013555A1
• Filed: 02/15/2001
• Published: 08/16/2001
• Est. Priority Date: 02/15/2000
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Egashira, Koji, Tanaka, Koji
• Granted Patent: US 6,663,721 B2
• Time in Patent Office: Days
• US Class Current: 239/13
• CPC Class Codes: H01L 21/67051 using mainly spraying means, e.g. nozzles
• CPC Class Codes: H01L 21/67057 with the semiconductor substrates being dipped in baths or vessels
• CPC Class Codes: Y10S 134/902 Semiconductor wafer

Abstract

A liquid processing apparatus is provided to improve its processing efficiency, together with a liquid processing method. The apparatus is capable of both reduction in temperature-variation of a processing liquid at processing and shortening for temperature-recovery of the processing liquid. Further, the liquid processing apparatus can facilitate the establishment of respective designated temperatures for different processes and carry out different processes continuously and effectively. The apparatus includes an inner cylinder 25 to accommodate semiconductor wafers W and a chemical supply unit 50 to supply the semiconductor wafers W in an inner cylindrical chamber 23 with a chemical liquid. The apparatus further includes a case heat exchanger 90 arranged in an outer peripheral position of the inner cylinder 25 and allowing a temperature-adjustment medium to flow and a medium supplier 100 to supply the regulator 90 with the temperature-adjustment medium.

Claims

1. A liquid processing apparatus for applying processing liquid on an object to be processed, comprising:

a case;

a processing chamber defined by the case to accommodate the object therein;

a liquid supplier for supplying processing liquid to the object in the processing chamber;

a case heat exchanger provided to the case and through which temperature-adjustment medium adjusted in temperature is able to flow and;

a medium supplier connected with the case heat exchanger to supply the temperature-adjustment medium to the case heat exchanger.

2. A liquid processing apparatus as claimed in

claim 1

, wherein

the medium supplier is connected with the case heat exchanger through switching device and also having a coolant source from which the temperature-adjustment medium as coolant is to be supplied.

3. A liquid processing apparatus as claimed in

claim 2

, further comprising a controller for controlling switching operation of the switching device.

8. A liquid processing apparatus as claimed in

claim 1

, further comprising a liquid temperature controller for controlling a temperature of the processing liquid in the liquid supplier, wherein

the medium supplier has a medium-circulating pipeline passing through the case heat exchanger and a medium-circulating pump interposed in the medium-circulating pipeline, whereby the temperature-adjustment medium flowing in the medium-circulating pipeline is adjusted in temperature by the liquid-temperature controller.

9. A liquid processing apparatus as claimed in

claim 8

, wherein the liquid supplier comprises:

a liquid nozzle for ejecting the processing liquid into the processing chamber;

a liquid reservoir for storing the processing liquid therein;

a liquid supply pipeline for connecting the liquid reservoir with the liquid nozzle; and

a liquid-temperature controller provided to the liquid reservoir to control temperature of the processing liquid stored in the liquid reservoir.

10. A liquid processing apparatus as claimed in

claim 9

, wherein

the liquid reservoir has an inner tank, an outer tank arranged outside the inner tank and also provided with the liquid-temperature controller and a medium circulating pipeline disposed between the outer tank and the inner tank so as to transfer heat between the processing liquid in the outer tank and the temperature-adjustment medium in the medium circulating pipeline.

11. A liquid processing apparatus as claimed in

claim 1

, wherein

the case heat exchanger have a meandering pipe arranged outside the case meanderingly and a spacer member disposed between the meandering pipe and an outer surface of the case;

the spacer member being made of heat conductive material; and

the spacer member having a first surface being in contact with the meandering pipe and shaped to be a cylindrical sidewall so as to be in contact with an outer face of the meandering pipe and a second surface being in contact with an outer face of the case and shaped to be a cylindrical sidewall so as to be contoured along the outer surface of the case.

12. A liquid processing apparatus as claimed in

claim 11

, wherein

the meandering pipe is overlaid with a thermal insulating sheet.

4. A liquid processing apparatus for applying processing liquid on an object to be processed, comprising:

a case;

a holder for holding the object rotatably;

a processing chamber surrounded by the case to accommodate the object and the holder therein;

a liquid supplier for supplying processing liquid to the object in the processing chamber; and

a case heat exchanger provided to the case.

5. A liquid processing apparatus as claimed in

claim 4

, wherein

temperature-adjustment medium adjusted in temperature is able to flow through the case heat exchanger.

6. A liquid processing apparatus as claimed in

claim 4

, wherein

the processing chamber has a first processing chamber and a second processing chamber surrounding the first processing chamber;

the case having a first case surrounding the first processing chamber and a second case surrounding the second processing chamber;

the first case and the second case being constructed so as to be movable relatively; and

the case heat exchanger being provided, at least, to the first case.

7. A liquid processing apparatus as claimed in

claim 4

, further comprising a medium supplier for supplying the temperature-adjustment medium to the case heat exchanger, whereby the temperature-adjustment medium supplied from the medium supplier flows through the case heat exchanger.

13. A liquid processing method of applying a process on an object to be processed by supplying processing liquid to the object accommodated in a processing chamber surrounded by a case, the liquid processing method comprising the step of:

making a temperature-adjustment medium adjusted in temperature flow to the outer surface of the case thereby to control temperature of the processing chamber, at the time when the processing liquid is supplied to the object accommodated in the processing chamber.

14. A liquid processing method of applying a process on an object to be processed by supplying processing liquid to the object accommodated in a processing chamber surrounded by a case, the liquid processing method comprising the step of:

making a temperature-adjustment medium flow into a case heat exchanger provided to the case thereby to control temperature of the processing chamber, at the time of a first process when the processing liquid is supplied to the object accommodated in the processing chamber;

stopping to supply the processing liquid and stopping the flow of the temperature-adjustment medium in the case heat exchanger; and

supplying the object with another processing liquid thereby to apply a second process on the object.

15. A liquid processing method as claimed in

claim 14

, further comprising the step of making the temperature of the processing chamber adjusted by supplying the temperature-adjustment medium, before the first process start.

16. A liquid processing method as claimed in

claim 14

, further comprising the step of making a temperature-adjustment medium for cooling pass through the case heat exchanger thereby to cool the processing chamber.

17. A liquid processing method of applying a process on an object to be processed by supplying processing liquid to the object accommodated in a processing chamber, the liquid processing method comprising the step of:

controlling temperature of the processing chamber at a first process to supply the processing liquid of a predetermined temperature to the object accommodated in the processing chamber;

stopping the supply of the processing liquid and simultaneously stopping the control of temperature of the processing chamber;

cooling an interior of the processing chamber adjusted in temperature; and

supplying the object with another processing liquid thereby to apply a second process on the object.

18. A liquid processing method as claimed in any one of

claim 17

, wherein the processing chamber is controlled so as to have the same temperature as the predetermined temperature of the processing liquid.

19. A liquid processing method as claimed in any one of

claim 17

, wherein the processing liquid is supplied to the rotating object.