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Method of coating substrate and coated article

  • US 20010016262A1
  • Filed: 01/04/2001
  • Published: 08/23/2001
  • Est. Priority Date: 01/07/2000
  • Status: Abandoned Application
First Claim
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1. A method of coating a substrate comprising sputtering a target material in a vacuum chamber having a controlled vacuum atmosphere to form a coating comprising said target material, wherein the composition of a sputtering gas introduced into said vacuum chamber is varied during the sputtering to form a coating having a composition gradient in the thickness direction thereof on said substrate.

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