Triple antimicrobial composition

• US 20010016589A1
• Filed: 01/11/2001
• Published: 08/23/2001
• Est. Priority Date: 11/13/1995
• Status: Active Grant

• Current Assignee: Trustees Of Columbia University In The City Of New York (Columbia University)
• Original Assignee: Trustees Of Columbia University In The City Of New York (Columbia University)
• Inventors: Caraos, Lauserpina, Modak, Shanta, Sampath, Lester
• Granted Patent: US 6,503,952 B2
• Time in Patent Office: Days
• US Class Current: 514/310
• CPC Class Codes: A01N 2300/00 Combinations or mixtures of active ingredients covered by classes A01N27/00 - A01N65/48 with other active or formulation relevant ingredients, e.g. specific carrier materials or surfactants, covered by classes A01N25/00 - A01N65/48
• CPC Class Codes: A01N 47/44 Guanidine; Derivatives thereof

Abstract

An antimicrobial composition comprising (i) between 0.025 and 2 percent of an antimicrobial agent selected from the group consisting of chlorhexidine free base, a chlorhexidine salt, polyhexamethylene biguanide, and alexidine; (ii) between 0.005 and 0.1 percent of a quaternary ammonium compound; and (iii) between 0.025 and 2 percent of a chlorinated phenol compound.

Claims

1. An antimicrobial composition comprising (i) between 0.025 and 2 percent of an antimicrobial agent selected from the group consisting of chlorhexidine free base, a chlorhexidine salt, polyhexamethylene biguanide, and alexidine;

(ii) between 0.005 and 0.1 percent of a quaternary ammonium compound; and

(iii) between 0.025 and 2 percent of a chlorinated phenol compound.

2. The composition of

claim 1

, wherein the quaternary ammonium compound is benzalkonium chloride.

3. The composition of

claim 1

, wherein the chlorinated phenol compound is parachlorometaxylenol.

4. The composition of

claim 1

, wherein the chlorinated phenol compound is triclosan.

5. The composition of

claim 2

, wherein the chlorinated phenol compound is parachlorometaxylenol.

6. The composition of

claim 2

, wherein the chlorinated phenol compound is triclosan.

7. The composition of

claim 4

, wherein the antimicrobial agent is chlorhexidine free base.

8. The composition of

claim 6

, wherein the antimicrobial agent is chlorhexidine free base.

9. A cream comprising the composition of

claim 1

.

10. A disinfectant wipe comprising the composition of

claim 1

.

11. A method of inhbiting the growth of bacteria on the skin, comprising applying a composition according to

claim 1

.

23. The composition of

claim 1

, further comprising between 50 and 70 percent alcohol.

12. An antimicrobial composition comprising (i) between 0.05 and 0.1 percent of an antimicrobial agent selected from the group consisting of chlorhexidine free base, a chlorhexidine salt, polyhexamethylene biguanide, and alexidine;

(ii) between 0.005 and 0.1 percent of a quaternary ammonium compound; and

(iii) between 0.025 and 0.1 percent of a chlorinated phenol compound.

13. The composition of

claim 12

, wherein the quaternary ammonium compound is benzalkonium chloride.

14. The composition of

claim 12

, wherein the chlorinated phenol compound is parachlorometaxylenol.

15. The composition of

claim 12

, wherein the chlorinated phenol compound is triclosan.

16. The composition of

claim 13

, wherein the chlorinated phenol compound is parachlorometaxylenol.

17. The composition of

claim 13

, wherein the chlorinated phenol compound is triclosan.

18. The composition of

claim 15

, wherein the antimicrobial agent is chlorhexidine free base.

19. The composition of

claim 17

, wherein the antimicrobial agent is chlorhexidine free base.

20. A cream comprising the composition of

claim 12

.

21. A disinfectant wipe comprising the composition of

claim 12

.

22. A method of inhbiting the growth of bacteria on the skin, comprising applying a composition according to

claim 12

.

24. The composition of

claim 12

, further comprising between 50 and 70 percent alcohol.