×

METHOD OF FORMING MULTILAYER CIRCUIT STRUCTURE

  • US 20010018796A1
  • Filed: 08/16/1999
  • Published: 09/06/2001
  • Est. Priority Date: 08/16/1999
  • Status: Abandoned Application
First Claim
Patent Images

1. A method for forming a multilayer circuit structure, the method comprising:

  • aligning an aperture in a first circuit substrate and an aperture in a second circuit substrate, wherein the first circuit substrate is flexible;

    inserting a tooth from a roller element into the aligned apertures of the first and the second circuit substrates;

    rotating the roller element; and

    laminating the first circuit substrate to the second circuit substrate.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×