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Process monitoring system for lithography lasers

  • US 20010020195A1
  • Filed: 12/08/2000
  • Published: 09/06/2001
  • Est. Priority Date: 02/16/2000
  • Status: Active Grant
First Claim
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1. A system for monitoring lithography lasers at at least one integrated circuit fabrication plant, said system, comprising:

  • A) a plurality of lasers each being configured for use as illumination sources in an integrated circuit lithography process, B) a terminal server associated with each one of said plurality of lasers;

    C) a central fabrication plant server unit in communication through a local area network with each of said plurality of lasers;

    said central fabrication plant unit being programmed to acquire data from each of said lasers and to store at least portions of the data in raw form and/or summary form;

    D) a second server unit providing communication through a communication network between said first server unit and computers utilized by persons having access authorization to the information stored by said first server unit;

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